journal article·2020-04

Modulation of Synaptic Plasticity Mimicked in Al Nanoparticle‐Embedded IGZO Synaptic Transistor

Jeehoon Kim, Younghun Kim, Ojun Kwon, Taehyeon Kim, Seyoung Oh, Soeun Jin, Woojin Park, Jung‐Dae Kwon, Seung‐Woo Hong, Chang‐Sik Lee, Ho‐Yong Ryu, Seoksu Hong, Jaehoon Kim, Tae‐Young Heo, Byungjin Cho

Advanced Electronic Materials· Volume 6· Issue 4
Publisher page

Abstract

Abstract Diverse artificial synapse structures and materials are widely proposed for neuromorphic hardware systems beyond von Neumann architecture owing to their capability to mimic complex information processing tasks such as image recognition, natural language processing, and learning. Nevertheless, temporal and spatial randomness in the movement of ion and electron particles that exist in materials usually prevents the solid‐state‐based synaptic devices from enabling the reliable modulation of synaptic plasticity. An aluminum nanoparticle (Al NP)‐embedded indium gallium zinc oxide (IGZO) synaptic transistor whose spike peak level and conductance change can be precisely modulated by the density of Al NPs within the IGZO channel is demonstrated. Essential synaptic functions including excitatory or inhibitory postsynaptic current, paired pulse facilitation, and short‐term potentiation or depression are also thoroughly emulated in the synaptic transistor device with the most optimized Al NP density: IGZO:Al NPs (6 nm). Moreover, controllable switching from short‐term to long‐term memory regimes essential for a learning task is demonstrated. Simulation results prove that this transistor can provide a decent recognition accuracy for neuromorphic computing. Indeed, the integrated IGZO:Al NP synaptic circuit with the effective synaptic plasticity will facilitate the implementation of a reconfigurable neuromorphic computing system.
Source: crossref · Quality: baseline

Research context

OpenAlex topics: Advanced Memory and Neural Computing · Photoreceptor and optogenetics research · CCD and CMOS Imaging Sensors

SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.

Affiliations

Department of Advanced Material Engineering Chungbuk National University 1 Chungdae‐ro, Seowon‐gu Cheongju Chungbuk 28644 Republic of Korea

Materials Center for Energy Convergence, Surface Technology Division Korea Institute of Materials Science (KIMS) 797 Changwondaero, Sungsan‐gu Changwon Gyeongnam 51508 Republic of Korea

Department of Advanced Materials Engineering University of Science and Technology (UST) 217 Gajeong‐ro, Yuseong‐gu Daejeon 34113 Republic of Korea

Intelligent Network Research Section Electronics and Telecommunications Research Institute 218 Gajeong‐ro, Yuseong‐gu Daejeon 34129 Republic of Korea

Department of Information & Statistics Chungbuk National University 1 Chungdae‐ro, Seowon‐gu Cheongju Chungbuk 28644 Republic of Korea

Funding

National Research Foundation of Korea · Ministry of Trade, Industry and Energy · Korea Institute for Advancement of Technology

References (41)

Show source-provided references
1. 10.1021/acsami.5b0854110.1021/acsami.5b08541 ↗
2. 10.1002/adma.20160431010.1002/adma.201604310 ↗
3. 10.1038/nmat485610.1038/nmat4856 ↗
4. 10.1038/s41563-017-0001-510.1038/s41563-017-0001-5 ↗
5. 10.1088/1361-6528/aa86f810.1088/1361-6528/aa86f8 ↗
6. 10.1093/cercor/6.4.62010.1093/cercor/6.4.620 ↗
7. 10.1523/JNEUROSCI.0514-09.200910.1523/JNEUROSCI.0514-09.2009 ↗
8. 10.4249/scholarpedia.315310.4249/scholarpedia.3153 ↗
9. 10.1016/S0166-2236(96)80018-X10.1016/S0166-2236(96)80018-X ↗
10. 10.1038/nrn223410.1038/nrn2234 ↗
11. Shi R. Z. · Adv. Neural Inf. Process. Syst. · 2004 · 16
12. 10.1126/science.125464210.1126/science.1254642 ↗
13. 10.1109/TBCAS.2019.292879310.1109/TBCAS.2019.2928793 ↗
14. 10.1021/nl201040y10.1021/nl201040y ↗
15. 10.1021/acsami.5b0182510.1021/acsami.5b01825 ↗
16. 10.1038/nnano.2016.7010.1038/nnano.2016.70 ↗
17. 10.1021/nl904092h10.1021/nl904092h ↗
18. 10.1038/nnano.2012.24010.1038/nnano.2012.240 ↗
19. 10.1038/ncomms307210.1038/ncomms3072 ↗
20. 10.1002/adma.20110372310.1002/adma.201103723 ↗
21. 10.1038/nmat305410.1038/nmat3054 ↗
22. 10.1021/acsnano.6b0789410.1021/acsnano.6b07894 ↗
23. 10.1038/ncomms367610.1038/ncomms3676 ↗
24. 10.1002/adfm.20150364510.1002/adfm.201503645 ↗
25. 10.1021/acs.nanolett.5b0328310.1021/acs.nanolett.5b03283 ↗
26. 10.1021/acsami.6b1374610.1021/acsami.6b13746 ↗
27. 10.1021/acsami.5b1019510.1021/acsami.5b10195 ↗
28. 10.1002/sia.74015010910.1002/sia.740150109 ↗
29. Lee J. S. · Appl. Phys. Lett. · 2009 · 95 · 2
30. 10.1002/adfm.20120341710.1002/adfm.201203417 ↗
31. 10.1016/j.jiec.2010.03.02110.1016/j.jiec.2010.03.021 ↗
32. 10.1039/C3TC32341B10.1039/C3TC32341B ↗
33. 10.1098/rstb.1999.037810.1098/rstb.1999.0378 ↗
34. 10.1109/LED.2013.228066310.1109/LED.2013.2280663 ↗
35. 10.1002/adfm.20180417010.1002/adfm.201804170 ↗
36. 10.1002/smll.20170119310.1002/smll.201701193 ↗
37. 10.1039/C8TC04740E10.1039/C8TC04740E ↗
38. 10.1002/adma.20180154810.1002/adma.201801548 ↗
39. 10.1002/adma.20170090610.1002/adma.201700906 ↗
40. 10.1109/TED.2015.243963510.1109/TED.2015.2439635 ↗
41. 10.1016/j.mser.2017.01.00310.1016/j.mser.2017.01.003 ↗