Laser photodeposition of thin semiconductor films from iron carbonyl vapors

Abstract Iron carbonyl vapors (Fe(CO)5) were used for laser chemical vapor deposition (LCVD) of nanometric structures based on iron oxides, Fe2O3−x (0 ≤ x ≤ 1). The deposition process was done by focused Ar+ laser radiation (λL = 488 nm) on Si substrate surface with a power density about 102 W/cm2 at vapor pressure of 666 Pa. Content analysis of deposited films made by auger electron spectroscopy (AES) revealed the presence of iron (Fe), carbon (C) and oxygen (O). Scanning electron microscopy (SEM) showed that the deposited films surface had nanometric cluster structure. The films exhibited semiconductor properties in the range 170–340 K.