journal article·2008-10

Defect study in ZnO related structures—A multi-spectroscopic approach

C.C. Ling, C.K. Cheung, Q.L. Gu, X.M. Dai, S.J. Xu, C.Y. Zhu, J.M. Luo, C.Y. Zhu, K.H. Tam, A.B. Djurišić, C.D. Beling, S. Fung, L.W. Lu, G. Brauer, W. Anwand, W. Skorupa, H.C. Ong

Applied Surface Science· Volume 255· Issue 1
Publisher page

Abstract

Abstract ZnO has attracted a great deal of attention in recent years because of its potential applications for fabricating optoelectronic devices. Using a multi-spectroscopic approach including positron annihilation spectroscopy (PAS), deep level transient spectroscopy (DLTS), photoluminescence (PL) and X-ray photoelectron spectroscopy (XPS), we have studied the two observed phenomena from ZnO related structures. They namely included the H 2 O 2 pre-treatment induced ohmic to rectifying contact conversion on Au/ n -ZnO contact and the p-type doping by nitrogen ion implantation. The aim of the studies was to offering comprehensive views as to how the defects influenced the structures electrical and optical properties of the structures. It was also shown that PAS measurement using the monoenergetic positron beam could offer valuable information of vacancy type defects in the vertical ZnO nanorod array structure.
Source: openaire · Quality: candidate unverified · Source record ↗

Research context

OpenAlex topics: ZnO doping and properties · Copper-based nanomaterials and applications · Electronic and Structural Properties of Oxides

SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.

References (33)

Show source-provided references
1. 2006
2. Özgür · J. Appl. Phys. · 2005 · 98 · 04130110.1063/1.1992666 ↗
3. Pearton · Prog. Mater. Sci. · 2005 · 50 · 29310.1016/j.pmatsci.2004.04.001 ↗
4. Look · Mater. Sci. Eng. B · 2001 · 80 · 38310.1016/S0921-5107(00)00604-8 ↗
5. Cheung · Appl. Surf. Sci. · 2006 · 252 · 313210.1016/j.apsusc.2005.08.111 ↗
6. van Veen · AIP Conf. Proc. · 1990 · 218 · 17110.1063/1.40182 ↗
7. Mead · Phys. Lett. · 1965 · 18 · 21810.1016/0031-9163(65)90295-7 ↗
8. Neville · J. Appl. Phys. · 1970 · 41 · 379510.1063/1.1659509 ↗
9. Coppa · Appl. Phys. Lett. · 2003 · 82 · 40010.1063/1.1536264 ↗
10. Auret · Appl. Phys. Lett. · 2001 · 79 · 307410.1063/1.1415050 ↗
11. Polyakov · Appl. Phys. Lett. · 2003 · 83 · 157510.1063/1.1604173 ↗
12. Yuan · J. Crystal Growth · 2004 · 268 · 16910.1016/j.jcrysgro.2004.05.007 ↗
13. Oh · Appl. Phys. Lett. · 2005 · 86 · 04211010.1063/1.1854191 ↗
14. Mosbacker · Appl. Phys. Lett. · 2005 · 87 · 01210210.1063/1.1984089 ↗
15. Sheng · Appl. Phys. Lett. · 2002 · 80 · 213210.1063/1.1463700 ↗
16. Ip · Appl. Phys. Lett. · 2004 · 84 · 513310.1063/1.1764940 ↗
17. Kim · Appl. Phys. Lett. · 2005 · 86 · 11210110.1063/1.1862772 ↗
18. Kim · Appl. Phys. Lett. · 2005 · 86 · 02210110.1063/1.1839285 ↗
19. von Wenckstern · Appl. Phys. Lett. · 2004 · 84 · 7910.1063/1.1638898 ↗
20. Weichsel · Sci. Technol. · 2005 · 20 · 840
21. Brillson · Appl. Phys. Lett. · 2007 · 90 · 10211610.1063/1.2711536 ↗
22. Gu · Appl. Phys. Lett. · 2007 · 90 · 12210110.1063/1.2715025 ↗
23. Brauer · Phys. Rev. B · 2006 · 74 · 04520810.1103/PhysRevB.74.045208 ↗
24. Tuomisto · Phys. Rev. Lett. · 2003 · 91 · 20550210.1103/PhysRevLett.91.205502 ↗
25. Koida · Appl. Phys. Lett. · 2003 · 82 · 53210.1063/1.1540220 ↗
26. Brunner · Mater. Sci. Forum. · 2001 · 363–365 · 14110.4028/www.scientific.net/MSF.363-365.141 ↗
27. Chen · Phys. Rev. B · 2004 · 69 · 03521010.1103/PhysRevB.69.035210 ↗
28. Gu · Appl. Phys. Lett. · 2008 · 92 · 22210910.1063/1.2940204 ↗
29. Ziegler · 1985
30. Janotti · Appl. Phys. Lett. · 2005 · 87 · 12210210.1063/1.2053360 ↗
31. Shi · J. Phys. Chem. B · 2006 · 110 · 1047510.1021/jp0610968 ↗
32. Tam · J. Phys. Chem. B · 2006 · 110 · 2086510.1021/jp063239w ↗
33. Yuk Fan Hsu · Adv. Funct. Mater. · 2008 · 18 · 102010.1002/adfm.200701083 ↗