Subsurface measurement of nanostructures on GaAs by electrostatic force microscopy

Abstract The size of surface buried oxide nanostructures are measured by electrostatic force microscopy (EFM). In contrast to atomic force microscopy that cannot probe subsurface structures and thickness, we show that EFM data include information about the thickness of individual nanostructures, consequently allowing us to determine the thickness of buried nanostructures on semiconductor substrates. We further show that this measurement can be performed simultaneously with AFM using EFM modulation spectroscopy.