journal article·2022-10

Improved ferroelectric characteristics of ALD lanthanum-doped hafnium oxide thin film by controlling post-cooling time

Boncheol Ku, Yooncheol Shin, Youngjun Lee, Taeheun Kim, Changhwan Choi

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OpenAlex topics: Ferroelectric and Negative Capacitance Devices · MXene and MAX Phase Materials · Semiconductor materials and devices

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