journal article·2026-03-01Open access

Growth and characterization of epitaxial co-substituted bismuth ferrite thin films on silicon substrates

Jie Chen, Kei Shigematsu, Hajime Nakayama, Koomok Lee, Ko Mibu, Masaki Azuma

AIP Advances· Volume 16· Issue 3

Abstract

BiFe0.9Co0.1O3 thin film is a promising candidate for low-power-consumption memory devices with electric voltage writing and magnetic readout capabilities. This study demonstrates successful epitaxial growth of single-crystal BiFe0.9Co0.1O3 thin films on (001)-oriented silicon substrates with SrRuO3/Pt/ZrO2 coated layers using pulsed laser deposition. We investigated the crystal structure, magnetic properties, and ferroelectric and magnetic domain structures of the thin films. The observed multiple leakage-free out-of-plane polarization switches in the as-grown BiFe0.9Co0.1O3 thin films indicate great potential for future applications in silicon-CMOS compatible nonvolatile memory devices.
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Research context

OpenAlex topics: Multiferroics and related materials · Ferroelectric and Piezoelectric Materials · Iron oxide chemistry and applications

SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.

Affiliations

Research Center for Autonomous Systems Materialogy (ASMat), Institute of Integrated Research, Institute of Science Tokyo 1 , 4259 Nagatsuta, Midori-ku, Yokohama, Kanagawa 226-8501,

Sumitomo Chemical Next-Generation Eco-Friendly Devices Collaborative Research Cluster, Institute of Science Tokyo 2 , 4259 Nagatsuta, Midori-ku, Yokohama, Kanagawa 226-8501,

Laboratory of Materials and Structures, Institute of Integrated Research, Institute of Science Tokyo 3 , 4259 Nagatsuta, Midori-ku, Yokohama, Kanagawa 226-8501,

Kanagawa Institute of Industrial Science and Technology 4 , 705-1 Shimoimaizumi, Ebina, Kanagawa 243-0435,

Department of Physical Science and Engineering, Nagoya Institute of Technology 5 , Nagoya 466-8555,

Funding

Japan Society for the Promotion of Science · Advanced Research Infrastructure for Materials and Nanotechnology

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