journal article·2021-11-01Open access

Simulation of nanoscale domain growth for ferroelectric recording

Kenji Fukuzawa, Yoshiomi Hiranaga, Yasuo Cho

AIP Advances· Volume 11· Issue 11

Abstract

The growth process of nm-scale polarization domains is of great interest from a physical point of view and is also important in the design of ferroelectric recording, which is expected to be a high-density information recording method. To clarify the growth of nanoscale domains in probe-based ferroelectric recording, a simulation method based on the time-dependent Ginzburg–Landau equation has been developed. In this method, wall pinning is included in the phenomenological free energy by using a coercive field. The simulation results agreed with the experimental results for nanoscale domain writing using a probe. The developed method was used to determine the relationship between the smallest writable domain size and the material properties: smaller wall energy density and larger saturation polarization and coercive field enable writing smaller domains. The developed method is thus effective in designing ferroelectric recording systems for high-density information storage.
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Research context

OpenAlex topics: Ferroelectric and Negative Capacitance Devices · Ferroelectric and Piezoelectric Materials · Acoustic Wave Resonator Technologies

SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.

Affiliations

Department of Micro/Nano Mechanical Science and Engineering, Nagoya University 1 , Furo-cho, Chikusa-ku, Nagoya 464-8603, Japan

Research Institute of Electrical Communication, Tohoku University 2 , Sendai 980-8577, Japan

Funding

Advanced Storage Research Consortium

References (32)

Show source-provided references
1. Phys. Rev. Lett. · 1995 · 74 · 430910.1103/physrevlett.74.4309 ↗
2. Nanotechnology · 2003 · 14 · 63710.1088/0957-4484/14/6/314 ↗
3. Jpn. J. Appl. Phys., Part 1 · 2009 · 48 · 09KA1810.1143/jjap.48.09ka18 ↗
4. Appl. Phys. Lett. · 2011 · 97 · 09290110.1063/1.3463470 ↗
5. Appl. Phys. Lett. · 2011 · 99 · 10290310.1063/1.3634052 ↗
6. Appl. Phys. Lett. · 2015 · 107 · 03291010.1063/1.4927450 ↗
7. Phys. Rev. · 1954 · 95 · 69010.1103/physrev.95.690 ↗
8. Phys. Rev. · 1960 · 117 · 146010.1103/physrev.117.1460 ↗
9. J. Appl. Phys. · 1975 · 28 · 22710.1063/1.1722712 ↗
10. Appl. Phys. Lett. · 1998 · 73 · 307310.1063/1.122676 ↗
11. Acta Mater. · 2004 · 52 · 74910.1016/j.actamat.2003.10.011 ↗
12. J. Appl. Phys. · 2005 · 97 · 07430510.1063/1.1866483 ↗
13. Phys. Rev. B · 2006 · 74 · 10410410.1103/physrevb.74.104104 ↗
14. Phys. Rev. B · 2015 · 91 · 05410410.1103/physrevb.91.054104 ↗
15. Appl. Phys. Lett. · 2001 · 79 · 53010.1063/1.1388024 ↗
16. Phys. Rev. Lett. · 2002 · 89 · 09760110.1103/physrevlett.89.097601 ↗
17. J. Appl. Phys. · 2003 · 93 · 623410.1063/1.1567033 ↗
18. Appl. Phys. Lett. · 2003 · 82 · 10310.1063/1.1534410 ↗
19. J. Appl. Phys. · 2003 · 94 · 338410.1063/1.1599958 ↗
20. Phys. Rev. B · 2005 · 71 · 13210210.1103/physrevb.71.132102 ↗
21. J. Appl. Phys. · 2006 · 100 · 05160810.1063/1.2337356 ↗
22. Phys. Rev. B · 2006 · 73 · 10444010.1103/physrevb.73.104440 ↗
23. Annu. Rev. Mater. Res. · 2008 · 38 · 35110.1146/annurev.matsci.37.052506.084303 ↗
24. J. Appl. Phys. · 2010 · 108 · 06410210.1063/1.3481409 ↗
25. J. Appl. Phys. · 2014 · 116 · 12410910.1063/1.4896730 ↗
26. Appl. Phys. Lett. · 2015 · 106 · 18290210.1063/1.4919872 ↗
27. Phys. Rev. B · 2015 · 91 · 21410910.1103/physrevb.91.214109 ↗
28. Rev. Sci. Instrum. · 1996 · 67 · 229710.1063/1.1146936 ↗
29. Appl. Phys. Lett. · 1999 · 75 · 283310.1063/1.125165 ↗
30. Jpn. J. Appl. Phys., Part 1 · 2001 · 40 · 353410.1143/jjap.40.3534 ↗
31. Appl. Phys. Lett. · 2003 · 83 · 265010.1063/1.1609252 ↗
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