Impact of biased cooling on the operation of undoped silicon quantum well field-effect devices
Source abstract
Abstract
Gate-tunable semiconductor nanosystems are getting more and more important in the realization of quantum circuits. While such devices are typically cooled to operation temperature with zero bias applied to the gate, biased cooling corresponds to a non-zero gate voltage being applied before reaching the operation temperature. We systematically study the effect of biased cooling on different undoped SiGe/Si/SiGe quantum well field-effect stacks designed to accumulate and density-tune two-dimensional electron gases (2DEGs). In an empirical model, we show that biased cooling of the undoped FES induces a static electric field, which is constant at operation temperature and superimposes onto the field exerted by the top gate onto the 2DEG. We show that the voltage operation window of the field-effect-tuned 2DEG can be chosen in a wide range of voltages via the choice of the biased cooling voltage. Importantly, quality features of the 2DEG such as the mobility or the temporal stability of the 2DEG density remain unaltered under biased cooling.
Source: crossref · Quality: baseline
Research context
OpenAlex topics: Quantum and electron transport phenomena · Advancements in Semiconductor Devices and Circuit Design · Semiconductor Quantum Structures and Devices
SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.
Affiliations
Fakultät für Physik, Universität Regensburg 1 , 93040 Regensburg,
IHP—Leibniz-Institut für innovative Mikroelektronik 2 , 15236 Frankfurt (Oder),
Funding
Deutsche Forschungsgemeinschaft · Bundesministerium für Bildung und Forschung · Bayerisches Staatsministerium für Wissenschaft und Kunst
References (31)
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