journal article·2021-06-01Open access

High-performance complementary resistive switching in ferroelectric film

Pan Zhang, Wenjing Zhai, Zhibo Yan, Xiang Li, Yongqiang Li, Shuhan Zheng, Yongsen Tang, Lin Lin, J.-M. Liu

AIP Advances· Volume 11· Issue 6

Abstract

The complementary resistive switch (CRS) offers a promising logic-in-memory functionality and is a potential solution to the “von Neumann bottleneck” problem, but the CRS structure composed of two anti-serially connected bipolar resistive switching cells limits device application. In this work, we report a high-performance CRS in a single layer of ferroelectric LiTaO3 film. The device has continuous tunable steady-states, stable operating voltages, a maximum off/on ratio more than 102, good retention longer than 105 s, and a good endurance of over 107 cycles. Besides, the energy consumption of the CRS is tunable by defect engineering. Experiments suggest that the ferroelectric domain switching with charged domain walls possibly contributes to the stability of the CRS in LiTaO3 film.
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Research context

OpenAlex topics: Advanced Memory and Neural Computing · Ferroelectric and Negative Capacitance Devices · Ferroelectric and Piezoelectric Materials

SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.

Affiliations

Laboratory of Solid-State Microstructures and Innovation Center of Advanced Microstructures, Nanjing University 1 , Nanjing 210093, China

Institute for Advanced Materials, Hubei Normal University 2 , Huangshi 435002, China

Institute for Advanced Materials, South China Normal University 3 , Guangzhou 510006, China

Funding

National Key Research Program of China · National Natural Science Foundation of China · National Key Research · Foundation for Fundamental Research for the Central Universities

References (29)

Show source-provided references
1. Nat. Electron. · 2020 · 3 · 25910.1038/s41928-020-0405-0 ↗
2. npj Quantum Mater. · 2020 · 5 · 8610.1038/s41535-020-00289-z ↗
3. Nat. Nanotechnol. · 2020 · 15 · 51710.1038/s41565-020-0647-z ↗
4. Adv. Electron. Mater. · 2015 · 1 · 150013810.1002/aelm.201500138 ↗
5. Sci. Rep. · 2016 · 6 · 2396710.1038/srep23967 ↗
6. Mater. Sci. Eng., R · 2014 · 83 · 110.1016/j.mser.2014.06.002 ↗
7. Nat. Nanotechnol. · 2016 · 11 · 6710.1038/nnano.2015.221 ↗
8. Nano Lett. · 2013 · 13 · 290810.1021/nl401287w ↗
9. Sci. Rep. · 2013 · 3 · 285610.1038/srep02856 ↗
11. J. Appl. Phys. · 2012 · 112 · 12451610.1063/1.4770489 ↗
12. IEEE Trans. Electron Devices · 2013 · 60 · 7010.1109/ted.2012.2226728 ↗
13. Adv. Mater. Sci. Eng. · 2014 · 57816810.1155/2014/927358 ↗
14. Rep. Prog. Phys. · 2012 · 75 · 07650210.1088/0034-4885/75/7/076502 ↗
15. Nano Lett. · 2012 · 12 · 552410.1021/nl302382k ↗
16. Nat. Commun. · 2013 · 4 · 180810.1038/ncomms2839 ↗
17. Sci. Adv. · 2017 · 3 · e170051210.1126/sciadv.1700512 ↗
18. Nat. Rev. Phys. · 2020 · 2 · 63410.1038/s42254-020-0235-z ↗
19. Nat. Mater. · 2020 · 19 · 118810.1038/s41563-020-0702-z ↗
20. 2019 · 393
21. Adv. Funct. Mater. · 2020 · 30 · 200010910.1002/adfm.202000109 ↗
22. J. Adv. Dielectr. · 2016 · 06 · 163000310.1142/s2010135x16300036 ↗
23. Phys. Rev. B · 2012 · 85 · 10410810.1103/physrevb.85.104108 ↗
24. Appl. Phys. Lett. · 2010 · 97 · 14290110.1063/1.3499273 ↗
25. Appl. Phys. Lett. · 2016 · 109 · 05350610.1063/1.4960523 ↗
26. Singh Nalwa · 2001 · 57
27. Adv. Funct. Mater. · 2014 · 24 · 531610.1002/adfm.201303520 ↗
28. Nanotechnology · 2013 · 24 · 38400810.1088/0957-4484/24/38/384008 ↗
29. Nano Lett. · 2020 · 20 · 587310.1021/acs.nanolett.0c01836 ↗