journal article·2019-05-01Open access

Simulation of sub-nm carrier profiling by scanning frequency comb microscopy

M. J. Hagmann, J. Wiedemeier

AIP Advances· Volume 9· Issue 5

Abstract

A mode-locked laser focused on the tunneling junction of a scanning tunneling microscope (STM) superimposes a microwave frequency comb with hundreds of harmonics on the DC tunneling current. Each harmonic, at an integer multiple of the laser pulse repetition frequency, sets the present state-of-the-art for narrow linewidth at its frequency to enable low-noise measurements at an average laser power of several milliwatts. Measurements of the attenuation of the harmonics, which is caused by the spreading resistance, may be used to determine the resistivity of the sample. In Scanning Frequency Comb Microscopy (SFCM) feedback control of the tip-sample distance is based on the power at the harmonics. No DC bias voltage or DC tunneling current is required and the data rate is much higher than that with an STM. Simulations of the spatial distribution of the power dissipated in the sample show the feasibility of non-destructive true sub-nm resolution in the carrier profiling of semiconductors. With no DC bias voltage and no DC tunneling current band-bending and other changes to semiconductor samples in an STM are mitigated and there is a possibility for in vivo microscopy in biology and medicine.
Source: crossref · Quality: baseline

Research context

OpenAlex topics: Plasmonic and Surface Plasmon Research · Photonic and Optical Devices · Force Microscopy Techniques and Applications

SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.

Affiliations

NewPath Research L.L.C. , Salt Lake City, Utah 84115, USA

Funding

National Science Foundation · U.S. Department of Energy

References (35)

Show source-provided references
1. Solid-State Electron. · 1993 · 36 · 14310.1016/0038-1101(93)90132-a ↗
2. Spreading resistance as a function of frequency
3. IEEE Trans. Microwave Theory Tech. · 1967 · 15 · 10110.1109/tmtt.1967.1126383 ↗
4. Solid-State Electron. · 1967 · 10 · 121310.1016/0038-1101(67)90063-9 ↗
5. AIP Advances · 2018 · 8 · 12520310.1063/1.5047440 ↗
6. Microelectron. Eng. · 2016 · 159 · 4610.1016/j.mee.2016.02.053 ↗
7. Rev. Sci. Instrum. · 2004 · 75 · 42210.1063/1.1641161 ↗
8. Appl. Microsc. · 2017 · 47 · 9510.9729/am.2017.47.3.95 ↗
9. Appl. Phys. Lett. · 2012 · 101 · 24110210.1063/1.4769982 ↗
10. J. Vac. Sci. Technol.B · 2017 · 35 · 03D10910.1116/1.4979549 ↗
11. J. Appl. Phys. · 2013 · 114 · 22310710.1063/1.4831952 ↗
12. Appl. Phys. Lett. · 2012 · 101 · 24110210.1063/1.4769982 ↗
13. Appl. Phys. Lett. · 2012 · 101 · 23110210.1063/1.4768952 ↗
14. Appl. Phys. Lett. · 2017 · 110 · 26311110.1063/1.4990392 ↗
15. J. Vac. Sci. Technol. B · 1992 · 10 · 50810.1116/1.586384 ↗
16. Electron Lett. · 2016 · 5 · 39510.1049/el.2015.3671 ↗
17. J. Appl. Phys. · 1963 · 34 · 179310.1063/1.1702682 ↗
18. Thin Solid Films · 2008 · 516 · 224410.1016/j.tsf.2007.08.067 ↗
19. Phys. Rev. B · 1999 · 60 · 1104510.1103/physrevb.60.11045 ↗
20. J. Appl. Phys. · 2018 · 123 · 13610110.1063/1.5019788 ↗
21. J. Vac. Sci. Technol. B · 2012 · 30 · 03320110.1116/1.3701977 ↗
22. Appl. Surf. Sci. · 2014 · 300 · 1610.1016/j.apsusc.2014.01.173 ↗
23. Nano Lett. · 2011 · 11 · 180010.1021/nl200461w ↗
24. Laser Phys. Lett. · 2014 · 11 · 06530110.1088/1612-2011/11/6/065301 ↗
25. Nat. Photonics · 2011 · 5 · 8310.1038/nphoton.2010.237 ↗
26. IEEE Spectr. · 2018 · 55 · 1410.1109/mspec.2018.8322035 ↗
27. Yield modeling of arbitrary defect outline
28. Semiconductor Industry Association · 1977 · 181
29. Int. J. Imaging Syst. Technol. · 1997 · 8 · 16810.1002/(sici)1098-1098(1997)8:2<168::aid-ima4>3.3.co;2-b ↗
30. J. Appl. Phys. · 2011 · 109 · 03470110.1063/1.3527056 ↗
31. 1953 · 1292
32. 1953 · 513
33. 2012 · 189
34. Phillips Res. Rep. · 1950 · 5 · 321
35. J. Phys. D.: Appl. Phys. · 2006 · 39 · 176110.1088/0022-3727/39/9/009 ↗