journal article·2018-08-01Open access

First-principle electronic properties of dilute-P AlNP deep ultraviolet semiconductor

Damir Borovac, Chee-Keong Tan, Nelson Tansu

AIP Advances· Volume 8· Issue 8

Abstract

The electronic properties of dilute-P AlN1-xPx alloys are investigated by means of First-Principle Density Functional Theory (DFT) calculations, where the phosphorus (P) content is varied from 0% up to 6.25%. Band structure calculations indicate significant modifications of the electronic properties with the introduction of P-atoms, with the possibility of tuning the energy band gap from 6.19eV down to 4.32eV by inserting 6.25% P-content in the AlN-based system. The carrier effective masses and lattice parameters (a and c) were analyzed, and a large bowing parameter of b = 28.3 ± 0.5 eV was found. Moreover, our findings suggest a potential pathway to engineer the valence band crossover between the crystal-field split-off (CH) band and the heavy hole (HH) band by inserting low amounts of P-content (∼1-2%) into the AlN1-xPx alloy. Thus, the dilute-P AlN1-xPx alloys may serve as potential candidates for implementation as the active region material for dominant transverse electric (TE) polarization for deep-UV emitting devices.
Source: crossref · Quality: baseline

Research context

OpenAlex topics: GaN-based semiconductor devices and materials · Ga2O3 and related materials · ZnO doping and properties

SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.

Affiliations

Center for Photonics and Nanoelectronics, Department of Electrical and Computer Engineering, Lehigh University 1 , Bethlehem, Pennsylvania 18015, USA

Department of Electrical and Computer Engineering, Clarkson University 2 , Potsdam, New York 13699, USA

Funding

National Science Foundation

References (46)

Show source-provided references
2. J. Phys.: Condens. Matter · 2002 · 14 · R96710.1088/0953-8984/14/38/201 ↗
3. Appl. Phys. Lett. · 2016 · 109 · 05160210.1063/1.4960375 ↗
4. IEEE J. Sel. Top. Quantum Electron. · 2009 · 15 · 102810.1109/jstqe.2009.2013476 ↗
5. J. Phys. D: Appl. Phys. · 2007 · 40 · 638610.1088/0022-3727/40/20/s19 ↗
6. Proc. IEEE · 2008 · 96 · 28710.1109/jproc.2007.911060 ↗
7. 2006
8. Crystals · 2017 · 7 · 30010.3390/cryst7100300 ↗
9. Appl. Phys. Express · 2017 · 10 · 310.7567/apex.10.031002 ↗
10. J. Phys. D · 2010 · 43 · 35400210.1088/0022-3727/43/35/354002 ↗
11. Appl. Phys. Express · 2012 · 5 · 08210110.1143/apex.5.082101 ↗
12. 12-15 (2016) · 1
13. Appl. Phys. Lett. · 2015 · 106 · 13110410.1063/1.4915255 ↗
14. Semiconductor Science and Tech. · 2014 · 29 · 810.1088/0268-1242/29/8/084005 ↗
15. Semiconductor Science and Tech. · 2011 · 26 · 01403610.1088/0268-1242/26/1/014036 ↗
16. Appl. Phys. Lett. · 2006 · 89 · 25110710.1063/1.2410242 ↗
17. Appl. Phys. Lett. · 2010 · 97 · 11110510.1063/1.3488825 ↗
18. J. Appl. Phys. Lett. · 2001 · 78 · 2210.1063/1.1374499 ↗
19. Jpn. J. Appl. Phys. · 2001 · 40 · 6B10.1143/jjap.40.l583 ↗
20. J. Crystal Growth · 2002 · 237-239 · 103710.1016/s0022-0248(01)02123-6 ↗
21. Appl. Phys. Lett. · 2004 · 84 · 148910.1063/1.1652232 ↗
22. Journal of Materials Research · 2009 · 24 · 356910.1557/jmr.2009.0435 ↗
23. Jour. of Crystal Growth · 2002 · 242 · 30210.1016/s0022-0248(02)01419-7 ↗
24. Appl. Phys. Lett. · 2008 · 92 · 01110410.1063/1.2829600 ↗
25. Sci. Rep. · 2016 · 6 · 1927110.1038/srep22215 ↗
26. Sci. Rep. · 2017 · 7 · 1728510.1038/s41598-017-17504-w ↗
27. J. Disp. Tech. · 2013 · 9 · 27210.1109/jdt.2013.2248342 ↗
28. AIP Advances · 2015 · 5 · 05713510.1063/1.4921394 ↗
29. Sci. Rep. · 2016 · 6 · 2441210.1038/srep22215 ↗
30. J. Appl. Phys. · 2001 · 90 · 235810.1063/1.1388170 ↗
31. Scientific Reports · 2016 · 6 · 2221510.1038/srep22215 ↗
32. Phys. Rev. B, Condens. Matter · 1995 · 51 · 2310.1103/physrevb.51.17196 ↗
33. Phys. Rev. B · 1993 · 47 · 5510.1103/physrevb.47.558 ↗
34. Phys. Rev. B · 1994 · 49 · 1425110.1103/physrevb.49.14251 ↗
35. Comput. Mat. Sci. · 1996 · 6 · 1510.1016/0927-0256(96)00008-0 ↗
36. Phys. Rev. B · 1996 · 54 · 1116910.1103/physrevb.54.11169 ↗
37. Phys. Rev. Lett. · 1996 · 77 · 1810.1103/physrevlett.77.3865 ↗
38. Phys. Rev. B · 1998 · 58 · 136710.1103/physrevb.58.1367 ↗
39. Jour. of Applied Phys. · 1973 · 44 · 29210.1063/1.1661876 ↗
40. Phys. Rev. B · 1996 · 54 · 1346010.1103/physrevb.54.13460 ↗
41. Phys. Rev. B · 2010 · 81 · 15521010.1103/physrevb.81.199901 ↗
42. Phys. Rev. B · 1992 · 46 · 1610.1103/physrevb.46.10086 ↗
43. J. Appl. Phys. · 2003 · 94 · 367510.1063/1.1600519 ↗
44. Appl. Phys. Lett. · 2001 · 78 · 286410.1063/1.1370549 ↗
45. Phys. Rev. B · 1995 · 52 · 813210.1103/physrevb.52.8132 ↗
46. J. of Appl. Phys. · 2012 · 111 · 11310810.1063/1.4728028 ↗