Logic implementation of 2-bit multiplier based on bidirectional rectification characteristics of hafnium-based ferroelectric diode
Source abstract
Abstract
The “memory wall” bottleneck in the Von Neumann architecture has driven the demand for in-memory computing devices. Ferroelectric memory has emerged as a strong contender for next-generation in-memory computing devices due to its advantages of high speed and low power consumption. However, conventional perovskite materials encounter difficulties in terms of scalability and compatibility with CMOS. Hafnium oxide-based ferroelectric materials, particularly Hf0.5Zr0.5O2 (HZO), address these issues. In this work, we fabricated ferroelectric diodes based on a W/HZO/W plug structure and verified that the current in the low-resistance state conforms to the Schottky emission transport mechanism. The device demonstrates stable polarization characteristics, intrinsic bidirectional rectification characteristics, and a discernible memory window, while facilitating non-destructive readout. We proposed a 2-bit multiplier scheme based on ferroelectric diodes, which requires only 11 devices and 16 operations, with a total power consumption as low as ∼11 fJ. The resistance state encoding has enabled the logic computation scheme that functions without additional state transitions or complex peripheral control circuits. Furthermore, the bidirectional rectification characteristics of the devices inherently enable sneak-path suppression in crossbar arrays, which eliminates the need for external selector devices. This work demonstrates the potential of ferroelectric diodes in self-selective crossbar arrays and logic-in-memory systems, driving the development of low-power memory-logic integration.
Source: crossref · Quality: baseline
Research context
OpenAlex topics: Ferroelectric and Negative Capacitance Devices · Advanced Memory and Neural Computing · Semiconductor materials and devices
SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.
Affiliations
College of Electronic Science and Technology, National University of Defense Technology , Changsha 410073,
Funding
National Natural Science Foundation of China · National Key Research and Development Program of China · The Science and Technology Innovation Program of Hunan Province
References (22)
Show source-provided references
1. In-memory computing with resistive switching devices10.1038/s41928-018-0092-2 ↗
2. Memory leads the way to better computing10.1038/nnano.2015.29 ↗
3. Memristive Bellman solver for decision-making10.1038/s41467-025-60085-w ↗
4. A highly CMOS compatible hafnia-based ferroelectric diode10.1038/s41467-020-15159-2 ↗
5. Ferroelectricity and antiferroelectricity of doped thin HfO2 -based films10.1002/adma.201404531 ↗
6. Ferroelectricity in HfO2 enables nonvolatile data storage in 28 nm HKMG
7. Ferroelectricity in hafnium oxide thin films10.1063/1.3634052 ↗
8. Ferroelectric hafnium oxide films for In-memory computing applications10.1002/aelm.202200951 ↗
9. Ferroelectric deep trench capacitors based on Al:HfO2 for 3D nonvolatile memory applications
10. Ferroelectric hafnium oxide: A CMOS-compatible and highly scalable approach to future ferroelectric memories
11. How to make DRAM non-volatile? Anti-ferroelectrics: A new paradigm for universal memories
12. First demonstration of vertically stacked ferroelectric Al doped HfO2 devices for NAND applications
13. Vertical ferroelectric HfO2 FET based on 3-D NAND architecture: Towards dense low-power memory
14. A ferroelectric fin diode for robust non-volatile memory10.1038/s41467-024-44759-5 ↗
15. HfZrOx -based switchable diode for logic-in-memory applications10.1109/ted.2020.3046541 ↗
16. Variability analysis and improvement strategies for nanoscale ferroelectric Hf0.5Zr0.5O2 utilizing schottky emission current in switchable diode10.1109/led.2024.3451968 ↗
17. Enhanced ON/OFF ratio (4 × 105) and robust endurance (>1010) in an InGaZnO/HfxZr1−xO2 ferroelectric diode via defect engineering10.1109/ted.2024.3360010 ↗
18. Reconfigurable aJ-level ferroelectric transistor-based boolean logic for logic-in-memory10.1021/acs.nanolett.4c02873 ↗
19. On the structural origins of ferroelectricity in HfO2 thin films10.1063/1.4919135 ↗
20. Ferroelectricity in simple binary ZrO2 and HfO210.1021/nl302049k ↗
21. Transport mechanism in Hf0.5Zr0.5O2-based ferroelectric diodes10.1007/s11432-021-3544-2 ↗
22. Leakage mechanism in ferroelectric Hf0.5Zr0.5O2 epitaxial thin films10.1016/j.apmt.2023.101804 ↗