journal article·2023-01-01Open access

A core drain current model for β-Ga2O3 power MOSFETs based on surface potential

Kai Zhou, Songming Miao, Xuanze Zhou, Guangwei Xu, Lingfei Wang, Shibing Long

AIP Advances· Volume 13· Issue 1

Abstract

For the first time, a core drain current model based on surface potential without any implicit functions is developed for beta-phase gallium oxide (β-Ga2O3) power metal-oxide-semiconductor field-effect transistors (MOSFETs). The surface potential solution is analytically deduced by solving the Poisson equation with appropriate simplification assumptions in accumulation, partial-depletion, and full-depletion modes. Then, the drain current expression is analytically derived from the Pao–Sah integral as a function of the mobile charge density obtained from the surface potential at the source and drain terminals. In addition, nonlinear resistors in the source/drain access region are considered. It continuously predicts the characteristics of β-Ga2O3 power MOSFETs in all operation modes, including accumulation mode, partial-depletion mode, and full-depletion mode. Furthermore, the validity of the model is verified by comparing the results of the model with the numerical simulations carried out with the technology computer-aided design (TCAD) tool ATLAS Device Simulator from Silvaco. Good agreement between the proposed model and TCAD simulations is shown for β-Ga2O3 power MOSFETs with different intrinsic channel lengths, channel doping concentrations, and channel thicknesses. Ultimately, the Gummel symmetry test and the harmonic balance simulation test are performed to validate the model’s robustness and convergence.
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Research context

OpenAlex topics: Ga2O3 and related materials · ZnO doping and properties · GaN-based semiconductor devices and materials

SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.

Affiliations

School of Microelectronics, University of Science and Technology of China 1 , Hefei 230026, China

Key Laboratory of Microelectronics Devices and Integration Technology, Institute of Microelectronics of Chinese Academy of Sciences 2 , Beijing 100029, China

Funding

National Natural Science Foundation of China · Strategic Priority Research Program of the Chinese Academy of Sciences · Key Research Program of Frontier Sciences of CAS · Fundamental Research Plan

References (37)

Show source-provided references
1. Proc. IEEE · 2001 · 89 · 89810.1109/5.931486 ↗
2. IEEE Trans. Electron Devices · 2013 · 60 · 65310.1109/ted.2012.2225836 ↗
3. IEEE J. Emerging Sel. Topics Power Electron. · 2019 · 7 · 710.1109/jestpe.2019.2894424 ↗
4. IEEE J. Emergin Sel. Topics Power Electron. · 2013 · 1 · 1110.1109/jestpe.2013.2260594 ↗
5. IEEE Trans. Ind. Electron. · 2006 · 53 · 100210.1109/tie.2006.878356 ↗
6. Joule · 2019 · 3 · 90310.1016/j.joule.2019.01.011 ↗
7. Appl. Phys. Lett. · 2012 · 100 · 01350410.1063/1.3674287 ↗
8. Appl. Phys. Lett. · 2018 · 112 · 06040110.1063/1.5017845 ↗
9. J. Appl. Phys. · 2018 · 124 · 22090110.1063/1.5062841 ↗
10. IEEE Trans. Power Electron. · 2003 · 18 · 90710.1109/tpel.2003.810840 ↗
11. Phys. Rev. · 1965 · 140 · A31610.1103/physrev.140.a316 ↗
12. Phys. Rev. B · 2017 · 96 · 24520510.1103/physrevb.96.245205 ↗
13. Appl. Phys. Lett. · 2016 · 109 · 21210110.1063/1.4968550 ↗
14. APL Mater. · 2019 · 7 · 02250610.1063/1.5058059 ↗
15. Appl. Phys. Rev. · 2018 · 5 · 01130110.1063/1.5006941 ↗
16. IEEE Trans. Power Electron. · 2020 · 35 · 515710.1109/tpel.2019.2946367 ↗
17. Fundamental Research · 2021 · 1 · 69710.1016/j.fmre.2021.11.002 ↗
18. IEEE Electron Device Lett. · 2016 · 37 · 90210.1109/led.2016.2568139 ↗
19. IEEE Electron Device Lett. · 2020 · 41 · 83610.1109/led.2020.2991146 ↗
20. IEEE Electron Device Lett. · 2018 · 39 · 157210.1109/led.2018.2865832 ↗
21. IEEE Electron Device Lett. · 2020 · 41 · 98910.1109/led.2020.2993555 ↗
22. Appl. Phys. Lett. · 2020 · 117 · 13350310.1063/5.0021242 ↗
23. IEEE Trans. Electron Devices · 2022 · 69 · 68210.1109/ted.2021.3137097 ↗
24. IEEE Trans. Electron Devices · 2021 · 68 · 150110.1109/ted.2021.3056326 ↗
25. ECS J. Solid State Sci. Technol. · 2020 · 9 · 03500310.1149/2162-8777/ab7673 ↗
26. Appl. Phys. Lett. · 2017 · 110 · 14350510.1063/1.4979789 ↗
27. IEEE Trans. Electron Devices · 2011 · 58 · 421910.1109/ted.2011.2169266 ↗
28. IEEE Trans. Electron Devices · 2011 · 58 · 262810.1109/ted.2011.2156413 ↗
29. IEEE Trans. Electron Devices · 2012 · 59 · 329210.1109/ted.2012.2221164 ↗
30. IEEE Trans. Electron Devices · 2012 · 59 · 351010.1109/ted.2012.2219055 ↗
31. IEEE Trans. Electron Devices · 1999 · 46 · 165610.1109/16.777154 ↗
32. J. Appl. Phys. · 2010 · 107 · 05450710.1063/1.3319656 ↗
33. IEEE Trans. Electron Devices · 2019 · 66 · 8010.1109/ted.2018.2868261 ↗
34. IEEE Trans. Electron Devices · 2013 · 60 · 321610.1109/ted.2013.2265320 ↗
35. 2021
36. 2021 · 2383
37. J. Appl. Phys. · 2015 · 117 · 21570510.1063/1.4922181 ↗