Density of defect states retrieved from the hysteretic gate transfer characteristics of monolayer MoS2 field effect transistors
Source abstract
Abstract
Defect states play an important role in low-dimensional semiconductor devices. However, it becomes increasingly challenging to find the density of defect states for ultra-scaled devices using traditional capacitive techniques such as capacitance-voltage (CV) method and deep level transient spectroscopy (DLTS). Here, we proposed a model to quantitatively retrieve the density of defect states from the hysteretic gate transfer characteristics of field effect transistors (FETs), and applied it to monolayer MoS2 FETs before and after superacid treatment. We found that the superacid treatment significantly reduced the density of deep level defects. As a result, the photoluminescence was enhanced 19 folds due to the suppression of non-radiative recombination via deep level defects.
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Research context
OpenAlex topics: 2D Materials and Applications · Nanowire Synthesis and Applications · MXene and MAX Phase Materials
SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.
Affiliations
University of Michigan - Shanghai Jiao Tong University Joint Institute, Shanghai Jiao Tong University 1 , Shanghai 200240, China
State Key Laboratory of ASIC and System, School of Information Science and Technology, Fudan University 2 , Shanghai 200433, China
Funding
National Natural Science Foundation of China
References (32)
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