journal article·2016-09-01Open access

Trap behaviours characterization of AlGaN/GaN high electron mobility transistors by room-temperature transient capacitance measurement

Bin Dong, Jie Lin, Ning Wang, Ling-li Jiang, Zong-dai Liu, Xiaoyan Hu, Kai Cheng, Hong-yu Yu

AIP Advances· Volume 6· Issue 9

Abstract

In this paper, the trap behaviours in AlGaN/GaN high electron mobility transistors (HEMTs) are investigated using transient capacitance measurement. By measuring the transient gate capacitance variance (ΔC) with different pulse height, the gate pulse induced trap behaviours in SiNX gate dielectric layer or at the SiNX/AlGaN interface is revealed. Based on the results, a model on electron traps in AlGaN/GaN HEMTs is proposed. The threshold voltage (Vth) instability in AlGaN/GaN HEMTs is believed to be correlated with the presence of these traps in SiNX gate dielectric layer or at the SiNX/AlGaN interface. Furthermore, trap density before and after step-stress applied on drain electrode is quantitatively analyzed based on ΔC measurement.
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Research context

OpenAlex topics: GaN-based semiconductor devices and materials · Semiconductor materials and devices · Silicon Carbide Semiconductor Technologies

SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.

Affiliations

Southern University of Science and Technology 1 Department of Electrical and Electronic Engineering, , Shenzhen, 518055, China

2Shenzhen Key Laboratory of 3rd Generation Semiconductor Devices, Shenzhen, China

Nanopolis Suzhou 3 Enkris Semiconductor Inc., NW-20v, , 99 Jinji Avenue, 215123, Suzhou, China

Funding

the fundamental research project of science and technology plan of shenzhen · the key laboratories of third-generation semiconductor devices in shen zhen, PRCHINA · key technology development of Si based GaN power devices · the project of energy-efficient si based GaN power devices

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