journal article·2025-02-01Open access

Stress modulation of hafnium-based ferroelectric material orientation in 3D cylindrical capacitor

Wenqi Li, Zhiliang Xia, Meiying Liu, Yong Cheng, Bao Zhang, Yuancheng Yang, Lei Liu, Zongliang Huo

AIP Advances· Volume 15· Issue 2

Abstract

Hafnium-based ferroelectric materials have attracted a lot of attention, but the distributions of the materials need to be tuned for commercialization, including phase distribution and polarization orientation distribution. The orientation of ferroelectric materials plays a significant role in memory device performance; however, there have been no reliable methods to control this orientation until now. This paper investigates the control of ferroelectric phase polarization orientation in 3D cylindrical capacitors. This optimization is made possible because the 3D cylindrical capacitor allows stress application in the tangential, axial, and radial directions, offering a wider range of adjustment options than 2D planar structures. The study focuses on how stress distribution affects ferroelectric phase orientation in hafnium-based materials when the diameters of cylindrical capacitors are varied. First, stress simulations are conducted to analyze the stress distribution in cylindrical capacitors with different diameters. The results indicate that the hafnium oxide layer experiences increased radical stress as the capacitor diameter decreases. Subsequently, capacitors with two different diameters are fabricated, significantly improving the polarization orientation in the thinner one. It is found that the capacitor diameter and the polarization orientation are strongly related through the correlation analysis. Finally, we demonstrate the improvement in the polarization orientation of ferroelectric thin films by radical stress through first-principles calculations. This study provides valuable insights into how stress distribution influences polarization orientation in hafnium-based ferroelectric films and is crucial for advancing the use of ferroelectric materials in future technologies.
Source: crossref · Quality: baseline

Research context

OpenAlex topics: Ferroelectric and Negative Capacitance Devices · MXene and MAX Phase Materials · Ferroelectric and Piezoelectric Materials

SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.

Affiliations

Institute of Microelectronics of the Chinese Academy of Sciences 1 , Beijing 100029,

University of Chinese Academy of Sciences 2 , Beijing 100049,

Yangtze Memory Technologies Innovation Research Institute 3 , Wuhan 30070,

Funding

National Key Research and Development Program of China

References (36)

Show source-provided references
1. Ferroelectricity in hafnium oxide thin films10.1063/1.3634052 ↗
2. Ultra-thin Hf0.5Zr0.5O2 thin-film-based ferroelectric tunnel junction via stress induced crystallization10.1063/5.0029516 ↗
3. Ferroelectricity in simple binary ZrO2 and HfO210.1021/nl302049k ↗
4. Experimental study of endurance characteristics of Al-doped HfO2 ferroelectric capacitor10.1088/1361-6528/acb7fc ↗
5. Importance of tailoring the thickness of SiO2 interlayer in the observation of ferroelectric characteristics in yttrium doped HfO2 films on silicon10.1016/j.vacuum.2020.109835 ↗
6. Ferroelectricity of pure HfOx in metal-ferroelectric-insulator-semiconductor stacks and its memory application10.1016/j.apsusc.2021.151566 ↗
7. Design space exploration of FeRAM bit cell for DRAM application10.1109/TED.2024.3435630 ↗
8. HAO + Al2O3 FeFET gate-stack for overall improvement in operating voltage, endurance, and retention10.1109/TED.2024.3453228 ↗
9. FeFET reliability modeling for in-memory computing: Challenges, perspective, and emerging trends10.1109/TED.2023.3313112 ↗
10. A rhombohedral ferroelectric phase in epitaxially strained Hf0.5Zr0.5O2 thin films10.1038/s41563-018-0196-0 ↗
11. Origin of the intrinsic ferroelectricity of HfO2 from ab initio molecular dynamics10.1021/acs.jpcc.9b04106 ↗
12. Mixed Al and Si doping in ferroelectric HfO2 thin films10.1063/1.4937588 ↗
13. Impact of thickness control of Hf0.5Zr0.5O2 films for the metal–ferroelectric–insulator–semiconductor capacitors10.1109/LED.2019.2917032 ↗
14. Unveiling the origin of robust ferroelectricity in sub-2 nm hafnium zirconium oxide films10.1021/acsami.1c08718 ↗
15. Effect of SiO2 interfacial layer reduction on MFSFET with 5 nm-thick ferroelectric nondoped HfO2 by deposition rate control10.1109/TSM.2023.3284829 ↗
16. Regulating ferroelectricity in Hf0.5Zr0.5O2 thin films: Exploring the combined impact of oxygen vacancy and electrode stresses10.1063/5.0170657 ↗
17. Understanding the stress effect of TiN top electrode on ferroelectricity in Hf0.5Zr0.5O2 thin films10.1063/5.0176345 ↗
18. Metal nitride electrode stress and chemistry effects on phase and polarization response in ferroelectric Hf0.5Zr0.5O2 thin films10.1002/admi.202100018 ↗
19. The effect of stress on HfO2-based ferroelectric thin films: A review of recent advances10.1063/5.0146998 ↗
20. Stress engineering as a strategy to achieve high ferroelectricity in thick hafnia using interlayer10.1109/TED.2021.3068246 ↗
21. Effect of high pressure anneal on switching dynamics of ferroelectric hafnium zirconium oxide capacitors10.1063/5.0050535 ↗
22. Annealing behavior of ferroelectric Si-doped HfO2 thin films10.1016/j.tsf.2016.07.009 ↗
23. Progress in computational understanding of ferroelectric mechanisms in HfO210.1038/s41524-024-01352-0 ↗
24. Engineering of ferroelectric HfO2–ZrO2 nanolaminates10.1021/acsami.7b00776 ↗
25. Insertion of HfO2 seed/dielectric layer to the ferroelectric HZO films for heightened remanent polarization in MFM capacitors10.1109/TED.2019.2961208 ↗
26. Structural and electrical comparison of Si and Zr doped hafnium oxide thin films and integrated FeFETs utilizing transmission Kikuchi diffraction10.3390/nano10020384 ↗
27. The effects of crystallographic orientation and strain of thin Hf0.5Zr0.5O2 film on its ferroelectricity10.1063/1.4866008 ↗
28. Performance improvement of HfO2-based ferroelectric with 3D cylindrical capacitor stress optimization10.1063/5.0205852 ↗
29. Promising engineering approaches for improving the reliability of HfZrOx 2-D and 3-D ferroelectric random access memories10.1109/TED.2020.3028528 ↗
30. Optimization of void defects at TiN/Si:HfO2 interface for 3-D ferroelectric memory10.1109/TSM.2024.3403230 ↗
31. Performance improvement of Hf0.5Zr0.5O2-based ferroelectric-field-effect transistors with ZrO2 seed layers10.1109/LED.2019.2903641 ↗
32. Local crystallographic phase detection and texture mapping in ferroelectric Zr doped HfO2 films by transmission-EBSD10.1063/1.5129318 ↗
33. Projector augmented-wave method10.1103/PhysRevB.50.17953 ↗
34. From ultrasoft pseudopotentials to the projector augmented-wave method10.1103/PhysRevB.59.1758 ↗
35. Efficient iterative schemes for ab initio total-energy calculations using a plane-wave basis set10.1103/PhysRevB.54.11169 ↗
36. Generalized gradient approximation made simple10.1103/PhysRevLett.77.3865 ↗