journal article·2024-12-01Open access

Molecular beam epitaxy of superconducting zirconium nitride on GaN substrates

Brelon J. May, Sabin Regmi, Amey R. Khanolkar, Volodymyr Buturlim, Zachery E. Cresswell, Kevin D. Vallejo, Krzysztof Gofryk, David H. Hurley

AIP Advances· Volume 14· Issue 12

Abstract

Epitaxial integration of metals and semiconductors can enable enhanced performance and novel functionality. Achieving such pristine interfaces with superconducting materials is of increasing interest for quantum devices and detectors, but the experimental demonstration remains challenging, given the very limited studies on single crystalline systems. To expand the potential materials for these systems, this work explores the deposition of zirconium nitride superconducting thin films on GaN substrates at various temperatures using molecular beam epitaxy. A general trend of decreasing superconducting critical temperature is observed as the deposition temperature is reduced. The optical properties reveal a transition from metallic to dielectric behavior with colder deposition. The plasma frequency of the metallic films is also observed to be a function of growth temperature. These results pave the way for the integration of a highly tunable metal nitride with a well-established semiconductor system.
Source: crossref · Quality: baseline

Research context

OpenAlex topics: Metal and Thin Film Mechanics · Machine Learning in Materials Science · Semiconductor materials and devices

SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.

Affiliations

Idaho National Laboratory , Idaho Falls, Idaho 83415,

Funding

Idaho Operations Office, U.S. Department of Energy · Energy Frontier Research Centers · Minority Serving Institution Partnership Program

References (43)

Show source-provided references
1. Solid-State Electron. · 1966 · 9 · 75110.1016/0038-1101(66)90116-x ↗
2. Adv. Funct. Mater. · 2020 · 30 · 190159710.1002/adfm.201901597 ↗
3. Phys. Rev. B · 2014 · 90 · 12542010.1103/physrevb.90.125420 ↗
4. P. Schindler , E. R.Antoniuk, G.Cheon, Y.Zhu, and E. J.Reed, arXiv:2011.10905 (2020).
5. 2020
6. Jpn. J. Appl. Phys. · 2019 · 58 · SC080110.7567/1347-4065/ab147b ↗
7. Mater. Sci. Rep. · 1990 · 5 · 9910.1016/S0920-2307(05)80003-9 ↗
8. Appl. Phys. Rev. · 2018 · 5 · 02110110.1063/1.5011972 ↗
9. IEEE Trans. Appl. Supercond. · 2015 · 25 · 110.1109/tasc.2014.2364214 ↗
10. Phys. Rev. Appl. · 2017 · 7 · 03402910.1103/physrevapplied.7.034029 ↗
11. Nano Lett. · 2021 · 21 · 827410.1021/acs.nanolett.1c02771 ↗
12. Science · 2017 · 355 · 93910.1126/science.aah6640 ↗
13. Appl. Phys. Lett. · 2023 · 123 · 25260210.1063/5.0175699 ↗
14. Sci. Adv. · 2021 · 7 · eabf138810.1126/sciadv.abf1388 ↗
15. JOM · 2001 · 53 · 5110.1007/s11837-001-0072-1 ↗
16. Thin Solid Films · 2019 · 688 · 13733910.1016/j.tsf.2019.05.058 ↗
17. J. Appl. Phys. · 2005 · 97 · 10D30610.1063/1.1846612 ↗
18. Nanotechnology · 2021 · 33 · 06200110.1088/1361-6528/ac2fe4 ↗
19. Phys. Rev. B · 2023 · 108 · 01450110.1103/physrevb.108.014501 ↗
20. J. Phys. Chem. Lett. · 2021 · 12 · 198510.1021/acs.jpclett.1c00011 ↗
21. Phys. Rev. B · 2022 · 105 · 22451610.1103/physrevb.105.224516 ↗
22. Nature · 2018 · 555 · 18310.1038/nature25768 ↗
23. Phys. Status Solidi A · 2020 · 217 · 190067510.1002/pssa.201900675 ↗
24. Appl. Phys. Express · 2015 · 8 · 08550110.7567/apex.8.085501 ↗
25. J. Cryst. Growth · 2009 · 311 · 123910.1016/j.jcrysgro.2008.12.050 ↗
26. J. Vac. Sci. Technol., A · 2006 · 24 · 55410.1116/1.2194031 ↗
27. Adv. Appl. Ceram. · 2016 · 115 · 29410.1179/1743676115y.0000000061 ↗
28. Optoelectron. Adv. Mater. · 2007 · 1 · 294
29. Appl. Phys. Lett. · 2023 · 123 · 17260210.1063/5.0176060 ↗
30. Phys. Rev. B · 2000 · 62 · 1391510.1103/physrevb.62.13915 ↗
31. Appl. Phys. Lett. · 2008 · 93 · 02310910.1063/1.2953541 ↗
32. J. Alloys Compd. · 2021 · 851 · 15592510.1016/j.jallcom.2020.155925 ↗
33. J. Vac. Sci. Technol., B · 2019 · 37 · 03121110.1116/1.5089779 ↗
34. J. Vac. Sci. Technol., B: Nanotechnol. Microelectron. · 2018 · 36 · 01120310.1116/1.5008523 ↗
35. Z. Phys. · 1937 · 106 · 14110.1007/bf01340315 ↗
36. APL Mater. · 2013 · 1 · 01100210.1063/1.4812323 ↗
37. J. Mater. Res. · 1986 · 1 · 44210.1557/jmr.1986.0442 ↗
38. Catal. Today · 2004 · 89 · 30710.1016/j.cattod.2003.12.006 ↗
39. Mater. Sci. Semicond. Process. · 2015 · 30 · 48610.1016/j.mssp.2014.10.029 ↗
40. Phys. Rev. Lett. · 2014 · 112 · 04700510.1103/physrevlett.112.047005 ↗
41. Laser Photonics Rev. · 2010 · 4 · 79510.1002/lpor.200900055 ↗
42. Adv. Mater. · 2013 · 25 · 326410.1002/adma.201205076 ↗
43. Phys. Rev. Mater. · 2021 · 5 · 06520110.1103/physrevmaterials.5.065201 ↗