Epitaxial GaAs and pHEMT on aluminum-transformed AlAs nanofilms
Source abstract
Abstract
Heterogeneous epitaxial growth between semiconductors and metals boosts novel device development and enables various applications. In this work, we have investigated the epitaxial growth of GaAs layers on top of a nanoscale aluminium-transformed AlAs film. The grown GaAs layers are single-crystalline and of high-quality, that has been evidenced by using various material characterization methods and by fabricating their high-electron mobility transistors. We found that an intriguing process named as “arsenidation” of aluminium film plays a key role in the successful epitaxy. Our work opens a window for growing semiconductor/metal hetero-structures for various device applications in the future.
Source: crossref · Quality: baseline
Research context
OpenAlex topics: Semiconductor Quantum Structures and Devices · Nanowire Synthesis and Applications · Advancements in Semiconductor Devices and Circuit Design
SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.
Affiliations
Department of Electronics Engineering, National Chiao Tung University 1 , Hsinchu, Taiwan
Department of Electronic Engineering, National Changhwa University of Education 2 , Changhwa, Taiwan
Funding
Ministry of Science and Technology, Taiwan
References (24)
Show source-provided references
1. Science · 1983 · 220 · 124110.1126/science.220.4603.1241 ↗
2. Rev. Mod. Phys. · 2001 · 73 · 76710.1103/revmodphys.73.767 ↗
3. J. Vac. Sci. Technol. · 1979 · 16 · 1310.1116/1.569860 ↗
4. Semicond. Sci. Technol. · 2010 · 25 · 07500110.1088/0268-1242/25/7/075001 ↗
5. J. Vac. Sci. Technol. B · 1994 · 12 · 130310.1116/1.587029 ↗
6. J. Crystal Growth · 1996 · 169 · 20110.1016/s0022-0248(96)00401-0 ↗
7. Science · 2012 · 337 · 45010.1126/science.1223504 ↗
8. Sci. Rep. · 2016 · 6 · 1988710.1038/srep19887 ↗
9. Nat. Nano. · 2007 · 2 · 25910.1038/nnano.2007.121 ↗
10. Appl Phys. Lett. · 1973 · 23 · 20110.1063/1.1654858 ↗
11. IBM J. Res. Develop. · 1978 · 22 · 34610.1147/rd.224.0346 ↗
12. Mater. Res. Soc. Proc. · 1996 · 399 · 537
13. J. Crystal Growth · 1979 · 47 · 38410.1016/0022-0248(79)90203-3 ↗
14. Appl. Phys. Lett. · 2001 · 78 · 284910.1063/1.1371528 ↗
15. Semicond · 2002 · 36 · 87810.1134/1.1500464 ↗
16. Appl. Phys. Lett. · 2005 · 87 · 21210910.1063/1.2135879 ↗
17. Appl. Phys. Lett. · 2007 · 90 · 09191010.1063/1.2709512 ↗
18. Appl. Phys. Lett. · 2007 · 93 · 25190610.1063/1.3056117 ↗
19. 2016 · 65
20. Jpn. J. Appl. Phys. · 2013 · 52 · 04580110.7567/jjap.52.045801 ↗
21. AIP Adv. · 2017 · 7 · 07521310.1063/1.4991435 ↗
22. Phys. Rev. Lett. · 1995 · 74 · 317710.1103/physrevlett.74.3177 ↗
23. IEEE Electron. Dev. Lett. · 1999 · 20 · 7310.1109/55.740656 ↗
24. Phys. Rev. Lett. · 1996 · 77 · 461610.1103/physrevlett.77.4616 ↗