Fast operation of a WO3-based solid-state electrochromic transistor
Source abstract
Abstract
Electrochromic transistors (ECTs) have attracted attention as advanced memory technology because one can use both electrochromism and switching of electrical conductivity in a nonvolatile manner. Although several solid-state ECTs have been proposed so far, their operating speed is still slow (operating time >1 min) as compared to liquid-based ECTs (∼20 s) due to their asymmetric gate-source electrode configuration. Here we demonstrate a fast operation of a solid-state ECT. We fabricated a solid-state ECT with three terminal gate-source-drain electrodes using an amorphous WO3 film as the electrochromic material and amorphous TaOx as the solid electrolyte. By the insertion of a thin ZnO layer between the source and drain electrodes to achieve pseudo symmetric gate-source electrode configuration, we greatly reduced the operation time to less than 1 s at ±3 V application while keeping the on-to-off ratio of ∼30. The present approach is effective to improve the operating speed of ECTs and may be practically used in advanced memory technologies.
Source: crossref · Quality: baseline
Research context
OpenAlex topics: Transition Metal Oxide Nanomaterials · Advanced Memory and Neural Computing · Perovskite Materials and Applications
SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.
Affiliations
Graduate School of Information Science and Technology, Hokkaido University 1 , N14W9, Kita, Sapporo 060-0814, Japan
Research Institute for Electronic Science, Hokkaido University 2 , N20W10, Kita, Sapporo 001-0020, Japan
Funding
Mitsubishi Foundation · Asahi Glass Foundation · Japan Society for the Promotion of Science
References (20)
Show source-provided references
1. Proc. IEEE · 2010 · 98 · 223710.1109/jproc.2010.2070830 ↗
2. Adv. Electron. Mater. · 2015 · 1 · 150003010.1002/aelm.201500030 ↗
3. Sci. Rep. · 2016 · 6 · 2581910.1038/srep25819 ↗
4. J Disp Technol · 2013 · 9 · 75510.1109/jdt.2013.2278015 ↗
5. New J. Chem. · 2011 · 35 · 132710.1039/c0nj00837k ↗
6. Appl. Phys. Lett. · 2008 · 92 · 03330410.1063/1.2834818 ↗
7. Adv. Mater. · 2017 · 29 · 170362810.1002/adma.201703628 ↗
8. Adv. Mater. · 2016 · 28 · 528410.1002/adma.201505631 ↗
9. Npj Quantum Mater · 2017 · 2 · 3510.1038/s41535-017-0039-2 ↗
10. Proc. Natl. Acad. Sci. USA · 2016 · 113 · 1114810.1073/pnas.1611745113 ↗
11. Adv. Mater. · 2018 · 30 · 180154810.1002/adma.201801548 ↗
12. Jpn. J. Appl. Phys. · 2018 · 57 · 04fk0110.7567/jjap.57.04fk01 ↗
13. Adv. Electron. Mater. · 2016 · 2 · 150041410.1002/aelm.201500414 ↗
14. Thin Solid Films · 2010 · 518 · 172210.1016/j.tsf.2009.11.062 ↗
15. Appl. Phys. Lett. · 1982 · 41 · 95810.1063/1.93355 ↗
16. J. Appl. Phys. · 1989 · 66 · 202710.1063/1.344341 ↗
17. Adv. Electron. Mater. · 2016 · 2 · 160004410.1002/aelm.201600044 ↗
18. J. Appl. Phys. · 1990 · 67 · 313210.1063/1.345390 ↗
19. J. Phys. Chem. C · 2015 · 119 · 2173210.1021/acs.jpcc.5b06777 ↗
20. Sci Rep · 2017 · 7 · 1225310.1038/s41598-017-12516-y ↗