journal article·2018-04-01Open access

Coupling of RF antennas to large volume helicon plasma

Lei Chang, Xinyue Hu, Lei Gao, Wei Chen, Xianming Wu, Xinfeng Sun, Ning Hu, Chongxiang Huang

AIP Advances· Volume 8· Issue 4

Abstract

Large volume helicon plasma sources are of particular interest for large scale semiconductor processing, high power plasma propulsion and recently plasma-material interaction under fusion conditions. This work is devoted to studying the coupling of four typical RF antennas to helicon plasma with infinite length and diameter of 0.5 m, and exploring its frequency dependence in the range of 13.56-70 MHz for coupling optimization. It is found that loop antenna is more efficient than half helix, Boswell and Nagoya III antennas for power absorption; radially parabolic density profile overwhelms Gaussian density profile in terms of antenna coupling for low-density plasma, but the superiority reverses for high-density plasma. Increasing the driving frequency results in power absorption more near plasma edge, but the overall power absorption increases with frequency. Perpendicular stream plots of wave magnetic field, wave electric field and perturbed current are also presented. This work can serve as an important reference for the experimental design of large volume helicon plasma source with high RF power.
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Research context

OpenAlex topics: Plasma Diagnostics and Applications · Particle accelerators and beam dynamics · Cryptographic Implementations and Security

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Affiliations

School of Aeronautics and Astronautics, Sichuan University 1 , Chengdu 610065, China

College of Aerospace Engineering, Chongqing University 3 , Chongqing 400044, China

National Key Laboratory of Science and Technology on Vacuum Technology and Physics, Lanzhou Institute of Physics 2 , Lanzhou 730000, China

Funding

Chongqing Postdoctroal Special Foundation · Pre-research of Key Laboratory Fund for Equipment · National Natural Science Foundation of China · China Postdoctoral Science Foundation · Chongqing Science and Technology Commission

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