journal article·2016-04-01Open access

Substantial enhancement of red emission intensity by embedding Eu-doped GaN into a microcavity

Tomohiro Inaba, Dong-gun Lee, Ryuta Wakamatsu, Takanori Kojima, Brandon Mitchell, Antonio Capretti, Tom Gregorkiewicz, Atsushi Koizumi, Yasufumi Fujiwara

AIP Advances· Volume 6· Issue 4

Abstract

We investigate resonantly excited photoluminescence from a Eu,O-codoped GaN layer embedded into a microcavity, consisting of an AlGaN/GaN distributed Bragg reflector and a Ag reflecting mirror. The microcavity is responsible for a 18.6-fold increase of the Eu emission intensity at ∼10K, and a 21-fold increase at room temperature. We systematically investigate the origin of this enhancement, and we conclude that it is due to the combination of several effects including, the lifetime shortening of the Eu emission, the strain-induced piezoelectric effect, and the increased extraction and excitation field efficiencies. This study paves the way for an alternative method to enhance the photoluminescence intensity in rare-earth doped semiconductor structures.
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Research context

OpenAlex topics: GaN-based semiconductor devices and materials · ZnO doping and properties · Acoustic Wave Resonator Technologies

SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.

Affiliations

Osaka University 1 Division of Materials and Manufacturing Science, Graduate School of Engineering, , 2-1 Yamadaoka, Suita, Osaka 565-0871, Japan

University of Mt. Union 2 Department of Physics and Astronomy, , 1972 Clark Ave, Alliance, OH, 44601, USA

University of Amsterdam 3 Van der Waals-Zeeman Institute, , Science Park 904, 1098 XH Amsterdam, The Netherlands

Funding

Grants-in-Aid for JSPS Fellows · Grants-in-Aid for Scientific Research

References (29)

Show source-provided references
1. Jpn. J. Appl. Phys. · 2004 · 43 · L26410.1143/JJAP.43.L264 ↗
2. Science · 1998 · 281 · 95610.1126/science.281.5379.956 ↗
3. Appl. Phys. Express · 2009 · 2 · 08210110.1143/APEX.2.082101 ↗
4. Appl. Phys. Lett. · 1998 · 72 · 173010.1063/1.121166 ↗
5. Jpn. J. Appl. Phys. · 1997 · 36 · L38210.1143/JJAP.36.L382 ↗
6. Appl. Phys. Lett. · 1999 · 75 · 118910.1063/1.124686 ↗
7. Appl. Phys. Express · 2009 · 2 · 07100410.1143/APEX.2.071004 ↗
8. Jpn. J. Appl. Phys. · 2014 · 5310.7567/JJAP.53.05FA13 ↗
9. Phys. Status Solidi A · 2010 · 207 · 139710.1002/pssa.200983467 ↗
10. J. Appl. Phys. · 2013 · 114 · 04350110.1063/1.4816088 ↗
11. Appl. Phys. Lett. · 2012 · 100 · 17190410.1063/1.4704920 ↗
12. Appl. Phys. Lett. · 2011 · 99 · 17190510.1063/1.3656018 ↗
13. Jpn. J. Appl. Phys · 2013 · 52 · 08JM0110.7567/JJAP.52.08JM01 ↗
14. Appl. Phys. Lett. · 1990 · 57 · 281410.1063/1.103771 ↗
15. Nat. Mater. · 2004 · 3 · 60110.1038/nmat1198 ↗
16. Appl. Phys. Lett. · 2015 · 106 · 12111210.1063/1.4916392 ↗
17. Sci Rep. · 2016
18. Jpn. J. Appl. Phys. · 2003 · 42 · L14410.1143/JJAP.42.L144 ↗
19. Opt. Mater. · 2011 · 33 · 105010.1016/j.optmat.2010.09.029 ↗
20. J. Appl. Phys. · 2013 · 114 · 04350110.1063/1.4816088 ↗
21. Appl. Phys. Lett. · 2015 · 106 · 24110510.1063/1.4922874 ↗
22. J. Chem. Phys. · 1980 · 73 · 334810.1063/1.440530 ↗
23. Appl. Phys. Lett. · 2005 · 87 · 07110210.1063/1.2010602 ↗
24. Phys. Rev. A · 1999 · 59 · 86510.1103/PhysRevA.59.865 ↗
25. Jpn. J. Appl. Phys. · 2013 · 52 · 08JM0310.7567/JJAP.52.08JM03 ↗
26. J. Chem. Phys. · 1988 · 89 · 178710.1063/1.455125 ↗
27. Appl. Phys. Lett. · 2010 · 96 · 03190810.1063/1.3295705 ↗
28. 1999
29. J Cryst. Growth · 1991 · 107 · 83210.1016/0022-0248(91)90565-M ↗