journal article·2016-09-01Open access

Induced conductivity in sol-gel ZnO films by passivation or elimination of Zn vacancies

D. J. Winarski, W. Anwand, A. Wagner, P. Saadatkia, F. A. Selim, M. Allen, B. Wenner, K. Leedy, J. Allen, S. Tetlak, D. C. Look

AIP Advances· Volume 6· Issue 9

Abstract

Undoped and Ga- and Al- doped ZnO films were synthesized using sol-gel and spin coating methods and characterized by X-ray diffraction, high-resolution scanning electron microscopy (SEM), optical spectroscopy and Hall-effect measurements. SEM measurements reveal an average grain size of 20 nm and distinct individual layer structure. Measurable conductivity was not detected in the unprocessed films; however, annealing in hydrogen or zinc environment induced significant conductivity (∼10−2 Ω.cm) in most films. Positron annihilation spectroscopy measurements provided strong evidence that the significant enhancement in conductivity was due to hydrogen passivation of Zn vacancy related defects or elimination of Zn vacancies by Zn interstitials which suppress their role as deep acceptors. Hydrogen passivation of cation vacancies is shown to play an important role in tuning the electrical conductivity of ZnO, similar to its role in passivation of defects at the Si/SiO2 interface that has been essential for the successful development of complementary metal–oxide–semiconductor (CMOS) devices. By comparison with hydrogen effect on other oxides, we suggest that hydrogen may play a universal role in oxides passivating cation vacancies and modifying their electronic properties.
Source: crossref · Quality: baseline

Research context

OpenAlex topics: ZnO doping and properties · Gas Sensing Nanomaterials and Sensors · Copper-based nanomaterials and applications

SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.

Affiliations

Bowling Green State University 1 Department of Physics and Astronomy, , Bowling Green, Ohio 43403, USA

Helmholtz-Zentrum Dresden-Rossendorf 2 Institute of Radiation Physics, , Bautzner Landstr. 400, 01328 Dresden, Germany

Eglin AFB 3 Air Force Research Laboratory, Munitions Directorate, , FL 32542, USA

Wright-Patterson Air Force Base 4 Air Force Research Laboratory Sensors Directorate, , Ohio, 45431, USA

Funding

Air Force Research Laboratory

References (35)

Show source-provided references
1. Materials · 2012 · 5 · 66110.3390/ma5040661 ↗
2. Chem. Mater. · 2012 · 24 · 304410.1021/cm301596x ↗
3. Mater. Sci. Eng. B · 2001 · 80 · 38310.1016/S0921-5107(00)00604-8 ↗
4. J. Appl. Phys. · 1992 · 71 · 88010.1063/1.351309 ↗
5. Appl. Phys. Lett. · 77 · 376110.1063/1.1331089 ↗
6. Procedia Engineering · 2012 · 36 · 5410.1016/j.proeng.2012.03.010 ↗
7. 2012 · 1370
8. Coatings · 2013 · 3 · 12610.3390/coatings3030126 ↗
9. Current Nanoscience · 2013 · 910.2174/1573413711309020020 ↗
10. Thin Solid Films · 2013 · 529 · 24210.1016/j.tsf.2012.10.079 ↗
11. Appl. Phys. A · 2010 · 104 · 263
12. Journal of Nanomaterials · 2013 · 2013 · 19652110.1155/2013/196521 ↗
13. Journal of Ceramic Processing Research · 2013 · 14 · 149
14. 1999
15. Journal of Crystal Growth · 2005 · 281 · 47510.1016/j.jcrysgro.2005.04.045 ↗
16. J. Appl. Phys. · 1999 · 86 · 97410.1063/1.370834 ↗
17. J. Appl. Phys. · 1997 · 91 · 392210.1063/1.1452778 ↗
18. Bull. Mater. Sci. · 1996 · 19 · 5110.1007/BF02744787 ↗
19. Ann. Rev. Mater. Res. · 2006 · 36 · 17910.1146/annurev.matsci.36.010705.155428 ↗
20. IEEE Trans. Electron Devices · 2000 · 47 · 177910.1109/16.870547 ↗
21. Phys. Rev. B · 2013 · 88 · 17410210.1103/PhysRevB.88.174102 ↗
22. Appl. Phys. Lett. · 2014 · 105 · 04110210.1063/1.4891677 ↗
23. Results in Physics · 2015 · 5 · 2810.1016/j.rinp.2015.01.002 ↗
24. Appl. Phys. Lett. · 2015 · 106 · 25190210.1063/1.4922944 ↗
25. Physica Status Solidi B · 2013 · 250 · 195310.1002/pssb.201370569 ↗
26. Phys. Rev. Lett. · 2007 · 99 · 08550210.1103/PhysRevLett.99.085502 ↗
27. 1979
28. Rev. Mod. Phys. · 1988 · 60 · 70110.1103/RevModPhys.60.701 ↗
29. J. Appl. Phys. · 2005 · 97 · 11353910.1063/1.1925769 ↗
30. Mat. Sci. and Eng. B-Solid · 2001 · 85 · 21210.1016/S0921-5107(01)00584-0 ↗
31. J. Vac. Sci. Technol. A · 2013 · 31 · 01A12010.1116/1.4765642 ↗
32. J. Electrochem. Soc. · 1989 · 136 · 341410.1149/1.2096463 ↗
33. Solid State Electron. · 2005 · 49 · 115810.1016/j.sse.2005.04.015 ↗
34. Thin Solid Films · 1983 · 102 · 110.1016/0040-6090(83)90256-0 ↗
35. Chem. Mater. · 2012 · 24 · 304410.1021/cm301596x ↗