journal article·2018-01-01Open access

Characterization of the inhomogeneous barrier distribution in a Pt/(100)β-Ga2O3 Schottky diode via its temperature-dependent electrical properties

Guangzhong Jian, Qiming He, Wenxiang Mu, Bo Fu, Hang Dong, Yuan Qin, Ying Zhang, Huiwen Xue, Shibing Long, Zhitai Jia, Hangbing Lv, Qi Liu, Xutang Tao, Ming Liu

AIP Advances· Volume 8· Issue 1

Abstract

β-Ga2O3 is an ultra-wide bandgap semiconductor with applications in power electronic devices. Revealing the transport characteristics of β-Ga2O3 devices at various temperatures is important for improving device performance and reliability. In this study, we fabricated a Pt/β-Ga2O3 Schottky barrier diode with good performance characteristics, such as a low ON-resistance, high forward current, and a large rectification ratio. Its temperature-dependent current–voltage and capacitance–voltage characteristics were measured at various temperatures. The characteristic diode parameters were derived using thermionic emission theory. The ideality factor n was found to decrease from 2.57 to 1.16 while the zero-bias barrier height Φb0 increased from 0.47 V to 1.00 V when the temperature was increased from 125 K to 350 K. This was explained by the Gaussian distribution of barrier height inhomogeneity. The mean barrier height Φ¯b0 = 1.27 V and zero-bias standard deviation σ0 = 0.13 V were obtained. A modified Richardson plot gave a Richardson constant A* of 36.02 A·cm−2·K−2, which is close to the theoretical value of 41.11 A·cm−2·K−2. The differences between the barrier heights determined using the capacitance–voltage and current–voltage curves were also in line with the Gaussian distribution of barrier height inhomogeneity.
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Research context

OpenAlex topics: Ga2O3 and related materials · ZnO doping and properties · Semiconductor materials and devices

SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.

Affiliations

Key Laboratory of Microelectronics Devices & Integration Technology, Institute of Microelectronics of Chinese Academy of Sciences 1 , Beijing 100029, China

University of Chinese Academy of Sciences 3 , Beijing 100049, China

Jiangsu National Synergetic Innovation Center for Advanced Materials (SICAM) 4 , Nanjing 210023, China

State Key Laboratory of Crystal Materials, Key Laboratory of Functional Crystal Materials and Device, Shandong University 2 , Jinan 250100, China

State Key Laboratory of Optoelectronic Materials and Technologies, Sun Yat-sen University 5 , Guangzhou 510275, China

Funding

Beijing Training Project for the Leading Talents in S&T · Key Research Program of Frontier Sciences of Chinese Academy of Sciences · Young Scholars Program of Shandong University · National Natural Science Foundation of China · Ministry of Science and Technology of the People's Republic of China

References (42)

Show source-provided references
1. IEEE Trans. Power Electron. · 2014 · 29 · 215510.1109/tpel.2013.2268900 ↗
2. Semicond. Sci. Technol. · 2016 · 31 · 03400110.1088/0268-1242/31/3/034001 ↗
3. IEEE Trans. Ind. Electron · 2013 · 60 · 263810.1109/tie.2012.2203771 ↗
4. Renew. Sust. Energ. Rev. · 2015 · 47 · 56210.1016/j.rser.2015.03.031 ↗
5. IEEE Trans. Ind. Electron. · 2014 · 61 · 138910.1109/tie.2013.2258304 ↗
6. IEEE Trans. Electron Devices · 2015 · 62 · 27810.1109/ted.2014.2359240 ↗
7. 2010
8. Phys. Status Solidi A · 2014 · 211 · 2110.1002/pssa.201330197 ↗
9. J. Alloys Compd. · 2017 · 714 · 45310.1016/j.jallcom.2017.04.185 ↗
10. CrystEngComm · 2017 · 19 · 512210.1039/c7ce01076a ↗
11. RSC Adv. · 2017 · 7 · 2181510.1039/c7ra01905j ↗
12. Appl. Phys. Express · 2017 · 10 · 04110210.7567/apex.10.041102 ↗
13. Jpn. J. Appl. Phys. · 2016 · 55 · 1202A120110.7567/jjap.55.1202a1 ↗
14. Appl. Phys. Lett. · 2012 · 101 · 13210610.1063/1.4755770 ↗
15. Appl. Phys. Lett. · 2016 · 108 · 13350310.1063/1.4945267 ↗
16. Appl. Phys. Lett. · 2017 · 110 · 10350610.1063/1.4977857 ↗
17. Appl. Phys. Lett. · 2017 · 110 · 09350310.1063/1.4977766 ↗
18. Appl. Phys. Lett. · 2012 · 100 · 01350410.1063/1.3674287 ↗
19. Appl. Phys. Lett. · 2013 · 103 · 12351110.1063/1.4821858 ↗
20. IEEE Electron Device Lett. · 2016 · 37 · 90210.1109/led.2016.2568139 ↗
21. IEEE Electron Device Lett. · 2016 · 37 · 21210.1109/led.2015.2512279 ↗
22. Appl. Phys. Lett. · 1986 · 49 · 8510.1063/1.97359 ↗
23. 2006
24. J. Appl. Phys. · 1991 · 69 · 152210.1063/1.347243 ↗
25. Appl. Phys. Lett. · 2013 · 6 · 08650210.7567/apex.6.086502 ↗
26. Appl. Phys. Lett. · 2008 · 92 · 20211810.1063/1.2910770 ↗
27. J. Electron. Mater. · 2017 · 46 · 205310.1007/s11664-016-5121-1 ↗
28. J. Phys. Chem. B · 2006 · 110 · 79610.1021/jp055844p ↗
29. Solid·State Electron · 1991 · 34 · 136510.1016/0038-1101(91)90031-s ↗
30. Phys. Rev. B · 2006 · 74 · 19512310.1103/physrevb.74.195123 ↗
31. 2D Mater. · 2017 · 4 · 01502410.1088/2053-1583/aa6aa0 ↗
32. Phys. Rep. · 2016 · 606 · 110.1016/j.physrep.2015.10.003 ↗
33. Appl. Surf. Sci. · 2003 · 217 · 25010.1016/s0169-4332(03)00564-6 ↗
34. Appl. Phys. Lett. · 1991 · 58 · 282110.1063/1.104747 ↗
35. Adv. Mater. Interfaces · 2014 · 110.1002/admi.201300057 ↗
36. Curr. Appl. Phys. · 2009 · 9 · 97210.1016/j.cap.2008.10.001 ↗
37. Solid State Electron. · 1996 · 39 · 17610.1016/0038-1101(95)00148-m ↗
38. Phys. Rev. B · 1992 · 45 · 1350910.1103/physrevb.45.13509 ↗
39. Org. Electron. · 2015 · 18 · 4410.1016/j.orgel.2015.01.007 ↗
40. Surf. Sci. · 1995 · 324 · 24910.1016/0039-6028(94)00791-8 ↗
41. Semicond. Sci. Tech. · 2005 · 20 · 62510.1088/0268-1242/20/6/025 ↗
42. IEEE Electron Device Lett. · 2000 · 21 · 26810.1109/55.843146 ↗