Quantum Kernel Learning for Small Dataset Modeling in Semiconductor Fabrication: Application to Ohmic Contact

Abstract Modeling complex semiconductor fabrication processes such as Ohmic contact formation remains challenging due to high‐dimensional parameter spaces and limited experimental data. While classical machine learning (CML) approaches have been successful in many domains, their performance degrades in small‐sample, nonlinear scenarios. In this work, quantum machine learning (QML) is investigated as an alternative, exploiting quantum kernels to capture intricate correlations from compact datasets. Using only 159 experimental GaN HEMT samples, a quantum kernel‐aligned regressor (QKAR) is developed combining a shallow Pauli‐Z feature map with a trainable quantum kernel alignment (QKA) layer. All models, including seven baseline CML regressors, are evaluated under a unified PCA‐based preprocessing pipeline to ensure a fair comparison. QKAR consistently outperforms classical baselines across multiple metrics (MAE, MSE, RMSE), achieving a mean absolute error of 0.338 Ω·mm when validated on experimental data. Noise robustness and generalization are further assessed through cross‐validation and new device fabrication. These findings suggest that carefully constructed QML models can provide predictive advantages in data‐constrained semiconductor modeling, offering a foundation for practical deployment on near‐term quantum hardware. While challenges remain for both QML and CML, this study demonstrates QML's potential as a complementary approach in complex process modeling tasks.