journal article·2007-06

Fabrication of fully transparent nanowire transistors for transparent and flexible electronics

Sanghyun Ju, Antonio Facchetti, Yi Xuan, Jun Liu, Fumiaki Ishikawa, Peide Ye, Chongwu Zhou, Tobin J. Marks, David B. Janes

Nature Nanotechnology· Volume 2· Issue 6
Publisher page

Abstract

The development of optically transparent and mechanically flexible electronic circuitry is an essential step in the effort to develop next-generation display technologies, including 'see-through' and conformable products. Nanowire transistors (NWTs) are of particular interest for future display devices because of their high carrier mobilities compared with bulk or thin-film transistors made from the same materials, the prospect of processing at low temperatures compatible with plastic substrates, as well as their optical transparency and inherent mechanical flexibility. Here we report fully transparent In(2)O(3) and ZnO NWTs fabricated on both glass and flexible plastic substrates, exhibiting high-performance n-type transistor characteristics with approximately 82% optical transparency. These NWTs should be attractive as pixel-switching and driving transistors in active-matrix organic light-emitting diode (AMOLED) displays. The transparency of the entire pixel area should significantly enhance aperture ratio efficiency in active-matrix arrays and thus substantially decrease power consumption.
Source: europepmc · Quality: candidate unverified · Source record ↗

Research context

OpenAlex topics: ZnO doping and properties · Thin-Film Transistor Technologies · Nanowire Synthesis and Applications

SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.

References (51)

Show source-provided references
1. Snell, A. J., Mackenzie, K. D., Spear, W. E., LeComber, P. G. & Hughes, A. J. Application of amorphous silicon field effect transistors in addressable liquid crystal display panels. Appl. Phys. Lett. 24, 357–362 (1981).
2. Madelung, O. (ed.) Technology and Applications of Amorphous Silicon (Springer, Berlin, 2000).
3. Ucjikoga, S. Low-temperature polycrystalline silicon thin-film transistor technologies for system-onglass displays. MRS Bull. 27, 881–886 (2002).10.1557/mrs2002.277 ↗
4. Carcia, P. F., McLean, R. S., Reilly, M. H. & Nunes, G. Transparent ZnO thin-film transistor fabricated by rf magnetron sputtering. Appl. Phys. Lett. 82, 1117–1119 (2003).10.1063/1.1553997 ↗
5. Fortunato, E. et al. Recent advances in ZnO transparent thin film transistors. Thin Solid Films 487, 205–211 (2005).10.1016/j.tsf.2005.01.066 ↗
6. Hoffman, R. L., Norris, B. J. & Wager, J. F. ZnO-based transparent thin-film transistors. Appl. Phys. Lett. 82, 733–735 (2003).10.1063/1.1542677 ↗
7. Nomura, K. et al. Thin-film transistor fabricated in single-crystalline transparent oxide semiconductor. Science 300, 1269–1272 (2003).10.1126/science.1083212 ↗
8. Presley, R. E. et al. Tin oxide transparent thin-film transistors. J. Phys. D. 37, 2810–2813 (2004).10.1088/0022-3727/37/20/006 ↗
9. Wang, L. et al. High performance all transparent inorganic–organic hybrid thin-film transistors. Nature Mater. 5, 893–900 (2006).10.1038/nmat1755 ↗
10. Hur, S.-H. Park, O. & Rogers, J.A. Extreme bendability of single-walled carbon nanotube networks transferred from high-temperature growth substrates to plastic and their use in thin-film transistors. Appl. Phys. Lett. 86, 243502 (2005).10.1063/1.1947380 ↗
11. Takenobu, T. et al. High-performance transparent flexible transistors using carbon nanotube films. Appl. Phy. Lett. 88, 33511 (2006).10.1063/1.2166693 ↗
12. Minami, T., Yamamoto, T., Toda, Y. & Miyata, T. Transparent conducting zinc-co-doped ITO films prepared by magnetron sputtering. Thin Solid Films 373, 189–194 (2000).10.1016/S0040-6090(00)01132-9 ↗
13. Yaglioglu, B., Yeom, H.-Y. & Paine, D. C. Crystallization of amorphous In2O3-10 wt% ZnO thin films annealed in air. Appl. Phy. Lett. 86, 261908 (2005).10.1063/1.1977209 ↗
14. Fortunato, E. et al. High mobility amorphous/nanocrystalline indium zinc oxide deposited at room temperature. Thin Solid Films 502, 104–107 (2006).10.1016/j.tsf.2005.07.311 ↗
15. Xiang, J. et al. Ge/Si nanowire heterostructures as high-performance field-effect transistors. Nature 441, 489–493 (2006).10.1038/nature04796 ↗
16. Cui, Y., Zhong, Z., Wang, D., Wang, W. U. & Lieber, C. M. High performance silicon nanowire field effect transistors. Nano Lett. 3, 149–152 (2003).10.1021/nl025875l ↗
17. Cha, S. N. et al. High performance ZnO nanowire field effect transistor. Proc. ESSDERC 217–220 (2005).10.1109/ESSDER.2005.1546624 ↗
18. Kim, W. et al. Germanium nanowire field-effect transistors with SiO2 and high-κ HfO2 gate dielectrics. Appl. Phys. Lett. 87, 173101 (2005).10.1063/1.2108127 ↗
19. Weiher, R. L. Electrical properties of single crystals of indium oxide. J. Appl. Phys. 33, 2834–2839 (1962).10.1063/1.1702560 ↗
20. Li, Y., Meng, G. W., Zhang, L. D. & Phillipp, F. Ordered semiconductor ZnO nanowire arrays and their photoluminescence properties. Appl. Phys. Lett. 76, 2011–2013 (2000).10.1063/1.126238 ↗
21. Yao, B. D., Chan, Y. F. & Wang, N. Formation of ZnO nanostructures by a simple way of thermal evaporation. Appl. Phys. Lett. 81, 757–759 (2002).10.1063/1.1495878 ↗
22. Banerjee, D. et al. Large-quantity free-standing ZnO nanowires. Appl. Phys. Lett. 83, 2061–2063 (2003).10.1063/1.1609036 ↗
23. Pan, Z. W., Dai, Z. R. & Wang, Z. L. Nanobelts of semiconducting oxides. Science 291, 1947–1949 (2001).10.1126/science.1058120 ↗
24. Wan, Q., Yu, K., Wang, T. H. & Lin, C. L. Low-field electron emission from tetrapod-like ZnO nanostructures synthesized by rapid evaporation. Appl. Phys. Lett. 83, 2253–2255 (2003).10.1063/1.1612899 ↗
25. Ju, S., Janes, D. B., Lu, G., Facchetti, A. & Marks, T. J. Effects of bias stress on ZnO nanowire field-effect transistors fabricated with organic gate nanodielectrics. Appl. Phys. Lett. 89, 193506 (2006).10.1063/1.2378445 ↗
26. Li, C. et al. Diameter-controlled growth of single-crystalline In2O3 nanowires and their electronic properties. Adv. Mater. 15, 143–145 (2003).10.1002/adma.200390029 ↗
27. Banerjee, D. et al. Synthesis and photoluminescence studies on ZnO nanowires. Nanotechnology 15, 404–409 (2004).10.1088/0957-4484/15/3/029 ↗
28. Lin, H. C., Ye, P. D. & Wilk, G. D. Leakage current and breakdown electric-field studies on ultrathin atomic-layer-deposited Al2O3 on GaAs. Appl. Phys. Lett. 87, 182904 (2005).10.1063/1.2120904 ↗
29. Lang, O. et al. Thin film growth and band lineup of In2O3 on the layered semiconductor InSe. J. Appl. Phys. 86, 5687–5691 (1999).10.1063/1.371579 ↗
30. Gassenbauer, Y. et al. Surface states, surface potentials, and segregation at surfaces of tin-doped In2O3 . Phys. Rev. B 73, 245312 (2006).10.1103/PhysRevB.73.245312 ↗
31. Goldberger, J., Sirbuly, D., Law, M. & Yang, P. ZnO nanowire transistors. J. Phys. Chem. B 109, 9–14 (2005).
32. Martins, R. et al. Zinc oxide as an ozone sensor. J. Appl. Phys. 96, 1398–1408 (2004).10.1063/1.1765864 ↗
33. Jiang, X., Wong, F. L., Fung, M. K. & Lee, S. T. Aluminum-doped zinc oxide films as transparent conductive electrode for organic light-emitting devices. Appl. Phys. Lett. 83, 1875–1877 (2003).10.1063/1.1605805 ↗
34. Kim, S. Y., Lee, J.-L., Kim, K.-B. & Tak, Y.-H. Effect of ultraviolet-ozone treatment of indium-tin-oxide on electrical properties of organic light emitting diodes. J. Appl. Phys. 95, 2560–2563 (2004).10.1063/1.1635995 ↗
35. Liu, F. et al. One-dimensional transport of In2O3 nanowires. Appl. Phys. Lett. 86, 213101 (2005).10.1063/1.1928323 ↗
36. Chang, P.-C. et al. High-performance ZnO nanowire field effect transistors. Appl. Phys. Lett. 89, 133113 (2006).10.1063/1.2357013 ↗
37. Zhang, D. et al. Electronic transport studies of single-crystalline In2O3 nanowires. Appl. Phys. Lett. 82, 112–114 (2003).10.1063/1.1534938 ↗
38. Cha, S. N. et al. High-performance ZnO nanowire field effect transistor using self-aligned nanogap gate electrodes. Appl. Phys. Lett. 89, 263102 (2006).10.1063/1.2416249 ↗
39. Moon, T.-H. et al. Chemical surface passivation of HfO2 films in a ZnO nanowire transistor. Nanotechnology 17, 2116–2121 (2006).10.1088/0957-4484/17/9/007 ↗
40. Ju, S. et al. Low operating voltage single ZnO nanowire field-effect transistors enabled by self-assembled organic gate nanodielectrics. Nano Lett. 5, 2281–2286 (2005).10.1021/nl051658j ↗
41. Ju, S. H. et al. High performance 2.2″ QCIF full color AMOLED displays based on electrophosphorescence. SID 02 DIGEST 37.3, 1096–1099 (2002).10.1889/1.1830135 ↗
42. Rao, S., Huang, L., Setyawan, W. & Hong, S. Nanotube electronics: Large-scale assembly of carbon nanotubes. Nature 425, 36–37 (2003).10.1038/425036a ↗
43. Wu, Y., Xiang, J., Yang, C., Lu, W. & Lieber, C. M. Single-crystal metallic nanowires and metal/semiconductor nanowire heterostructures. Nature 430, 61–65 (2004).10.1038/nature02674 ↗
44. Joseph, V. R. et al. Electronic connection to the interior of a mesoporous insulator with nanowires of crystalline RuO2 . Nature 406, 169–172 (2000).10.1038/35018040 ↗
45. Huang, Y., Duan, X., Wei, Q. & Lieber, C. M. Directed assembly of one-dimensional nanostructures into functional networks. Science 291, 630–633 (2001).10.1126/science.291.5504.630 ↗
46. Kuykendall, T. et al. Crystallographic alignment of high-density gallium nitride nanowire arrays. Nature Mater. 3, 524–528 (2004).10.1038/nmat1177 ↗
47. Duan, X. et al. High-performance thin-film transistors using semiconductor nanowires and nanoribbons. Nature 425, 274–278 (2003).10.1038/nature01996 ↗
48. Menard, E., Lee, K. J., Khang, D. Y., Nuzzo, R. G. & Rogers, J. A. A printable form of silicon for high performance thin film transistors on plastic substrates. Appl. Phys. Lett. 84, 5398–5400 (2004).10.1063/1.1767591 ↗
49. Ju, S. et al. n-Type field-effect transistors using multiple Mg-doped ZnO nanorods. IEEE Trans. Nanotech. (in the press).
50. Wang, D. et al. Germanium nanowire field-effect transistors with SiO2 and high-κ HfO2 gate dielectrics. Appl. Phys. Lett. 83, 2432–2434 (2003).10.1063/1.1611644 ↗
51. Vashaee, D. et al. Electrostatics of nanowire transistors with triangular cross sections. J. Appl. Phys. 99, 54310 (2006).10.1063/1.2168229 ↗