journal article·2024-10-30Open access

Highly Conductive Paths in Diamond and their Application in High Pressure Measurements

Mateusz Gramala, Andrzej Sikora, Aleksandra Chudzyńska, Łukasz Gelczuk, Filip Dybała, Paweł Modrzyński, Robert Kudrawiec

ACS Applied Materials & Interfaces· Volume 16· Issue 43

Abstract

High Resolution Image Download MS PowerPoint Slide Diamonds possess exceptional properties such as high mechanical strength, thermal conductivity, and electrical resistance, making them suitable for various applications, including high-power electronics and optoelectronics. However, fabricating conductive structures in diamond remains a significant technological challenge. In this publication, we present a controlled process for fabricating precise amorphous conductive paths in a monocrystalline diamond using a focused ion beam (FIB) technique. The resistivity and thickness of the fabricated structures were determined, and their morphology was carefully characterized. The results showed that the optimal charge dose for achieving the lowest resistance was found to be 10 17 ions/cm 2 . The fabricated structures exhibited amorphous morphology. Elemental analysis confirmed the presence of gallium ions in the modified material. The resistivity of the conductive paths was determined to be 30 μΩm, which is remarkably low compared to previous studies and only 1–2 orders of magnitude higher than in metals. Additionally, it is shown that this technology has potential applications in high-pressure chambers and the development of high-pressure sensors within diamond anvils. Overall, this study provides valuable insights into fabricating conductive structures on diamonds using FIB and opens up possibilities for diamond electronics.
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Research context

OpenAlex topics: Diamond and Carbon-based Materials Research · Force Microscopy Techniques and Applications · High-pressure geophysics and materials

SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.

Affiliations

Nanores Sp. z o.o. Sp. k., Bierutowska 57-59, Wrocław 53-317, Poland

Department of Semiconductor Materials Engineering, Wrocław University of Science and Technology, Wybrzeże Wyspiańskiego 27, Wrocław 50-370, Poland

Department of Nanometrology, Faculty of Electronics, Photonics and Microsystems, Wrocław University of Science and Technology, Janiszewskiego 11-17, Wrocław 50-372, Poland

Department of Optical Spectroscopy, W. Trzebiatowski Institute of Low Temperature and Structural Research of the Polish Academy of Sciences, Okólna 2, Wroclaw 50-422, Poland

Funding

Narodowe Centrum Badan i Rozwoju

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