Electronically Controlled Chemical Stability of Compound Semiconductor Surfaces
Source abstract
Abstract
Effects of a humid environment on the degradation of semiconductors were studied to understand the role of the surface charge on material stability. Two distinctly different semiconductors with the Fermi level stabilization energy EFS located inside the conduction band (CdO) and valence band (SnTe) were selected, and effects of an exposure to 85 °C and 85% relative humidity conditions on their electrical properties were investigated. Undoped CdO films with bulk Fermi level EF below EFS and positively charged surface are very unstable. The stability greatly improves with doping when EF shifts above EFS, and the surface becomes negatively charged. This charge-controlled reactivity is further confirmed by the superior stability of undoped p-type SnTe with EF above EFS. These distinct reactivities are explained by the surface attracting either the reactive OH– or passivating H+ ions. The present results have important implications for understanding the interaction of semiconductor surfaces with water or, in general, ionic solutions.
Source: openalex_inverted_index · Quality: baseline
Research context
OpenAlex topics: ZnO doping and properties · Gas Sensing Nanomaterials and Sensors · Chalcogenide Semiconductor Thin Films
SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.
Affiliations
School of Materials Science and Engineering, South China University of Technology, Guangzhou 510640, China
Materials Sciences Division, Lawrence Berkeley National Laboratory, Berkeley, California 94720, United States
Department of Physics, City University of Hong Kong, Kowloon 999077, Hong Kong
Funding
Research Grants Council, University Grants Committee · China Scholarship Council · Natural Science Foundation of Guangdong Province · National Natural Science Foundation of China · Lawrence Berkeley National Laboratory
References (40)
Show source-provided references
1. 10.1039/C5EE02733K10.1039/C5EE02733K ↗
2. 10.1021/nl400349b10.1021/nl400349b ↗
3. 10.1016/j.microrel.2009.07.04610.1016/j.microrel.2009.07.046 ↗
4. 10.1109/50.91789710.1109/50.917897 ↗
5. 10.1063/1.481597010.1063/1.4815970 ↗
6. 10.1063/1.9549610.1063/1.95496 ↗
7. 10.1021/la00099a01010.1021/la00099a010 ↗
8. 10.1021/j100182a05410.1021/j100182a054 ↗
9. 10.1063/1.10865010.1063/1.108650 ↗
10. 10.1016/j.tsf.2006.12.12710.1016/j.tsf.2006.12.127 ↗
11. 10.1103/PhysRevB.37.476010.1103/PhysRevB.37.4760 ↗
12. 10.1063/1.342844410.1063/1.3428444 ↗
13. 10.1103/PhysRevB.71.16120110.1103/PhysRevB.71.161201 ↗
14. 10.1038/srep2795410.1038/srep27954 ↗
15. 10.1116/1.58372910.1116/1.583729 ↗
16. 10.7567/APEX.7.09120110.7567/APEX.7.091201 ↗
17. 10.1016/S0921-4526(01)00417-310.1016/S0921-4526(01)00417-3 ↗
18. 10.1063/1.307236710.1063/1.3072367 ↗
19. 10.1088/0022-3727/48/42/42300110.1088/0022-3727/48/42/423001 ↗
20. 10.1088/0957-4484/18/21/21520210.1088/0957-4484/18/21/215202 ↗
21. 10.1038/srep4361110.1038/srep43611 ↗
22. 10.1016/S0038-1101(01)00175-710.1016/S0038-1101(01)00175-7 ↗
23. 10.1021/acs.nanolett.6b0239510.1021/acs.nanolett.6b02395 ↗
24. 10.1021/acs.jpclett.8b0144610.1021/acs.jpclett.8b01446 ↗
25. 10.1016/0022-3697(57)90013-610.1016/0022-3697(57)90013-6 ↗
26. 10.1063/1.283326910.1063/1.2833269 ↗
27. 10.1116/1.58424610.1116/1.584246 ↗
28. 10.1103/PhysRev.138.A86410.1103/PhysRev.138.A864 ↗
29. 10.1016/j.mssp.2015.08.00510.1016/j.mssp.2015.08.005 ↗
30. 10.1038/nature0166510.1038/nature01665 ↗
31. Ioffe Physical Technical Institute, http://www.ioffe.ru/SVA/NSM/Semicond/GaAs/. 1998–2001.
32. 10.1039/B800489G10.1039/B800489G ↗
33. 10.1016/S0360-3199(02)00022-810.1016/S0360-3199(02)00022-8 ↗
34. 10.1038/nmat451110.1038/nmat4511 ↗
35. 10.1021/cm502507410.1021/cm5025074 ↗
36. 10.1021/jp401972h10.1021/jp401972h ↗
37. 10.1063/1.494823610.1063/1.4948236 ↗
38. 10.1103/PhysRevApplied.6.06401810.1103/PhysRevApplied.6.064018 ↗
39. 10.1002/ente.20170064110.1002/ente.201700641 ↗
40. Mayer, M. SIMNRA (Max-Planck-Institut für Plasmaphysik, https://home.mpcdf.mpg.de/~mam/). 2007.