journal article·2016-12-14

Edge Dislocations Triggered Surface Instability in Tensile Epitaxial Hexagonal Nitride Semiconductor

Jianpeng Cheng, Xuelin Yang, Jie Zhang, Anqi Hu, Panfeng Ji, Yuxia Feng, Lei Guo, Chenguang He, Lisheng Zhang, Fujun Xu, Ning Tang, Xinqiang Wang, Bo Shen

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Abstract

Understanding the semiconductor surface and its properties including surface stability, atomic morphologies, and even electronic states is of great importance not only for understanding surface growth kinetics but also for evaluating the degree to which they affect the devices' performance. Here, we report studies on the nanoscale fissures related surface instability in AlGaN/GaN heterostructures. Experimental results reveal that edge dislocations are actually the root cause of the surface instability. The nanoscale fissures are initially triggered by the edge dislocations, and the subsequent evolution is associated with tensile lattice-mismatch stress and hydrogen etching. Our findings resolve a long-standing problem on the surface instability in AlGaN/GaN heterostructures and will also lead to new understandings of surface growth kinetics in other hexagonal semiconductor systems.
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Research context

OpenAlex topics: GaN-based semiconductor devices and materials · Ga2O3 and related materials · ZnO doping and properties

SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.

Affiliations

State Key Laboratory of Artificial Microstructure and Mesoscopic Physics, School of Physics, Peking University, Beijing 100871, P. R. China

Collaborative Innovation Center of Quantum Matter, Beijing 100871, P. R. China

Funding

Ministry of Science and Technology of the People's Republic of China · National Natural Science Foundation of China · Beijing Municipality · Key Laboratory of Nanodevices and Applications

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