Spontaneous Pt Deposition on Defective Surfaces of In₂O₃ Nanocrystals Confined within Cavities of Hollow Silica Nanoshells: Pt Catalyst-Modified ITO Electrode with Enhanced ECL Performance

Although the deposition of metallic domains on a preformed semiconductor nanocrystal provides an effective pathway to access diverse hybrid nanocrystals with synergistic metal/semiconductor heterojunction interface, those reactions that take place on the surface of semiconductor nanoscrystals have not been investigated thoroughly, because of the impediments caused by the surface-capping organic surfactants. By exploiting the interfacial reactions occurring between the solution and nanoparticles confined with the cavities of hollow nanoparticles, we propose a novel nanospace-confined strategy for assessing the innate reactivity of surfaces of inorganic semiconductor nanoparticles. This strategy was adopted to investigate the newly discovered process of spontaneous Pt deposition on In 2 O 3 nanocrystals. Through an in-depth examination involving varying key reaction parameters, the Pt deposition process was identified to be templated by the defective In 2 O 3 surface via a unique redox process involving the oxygen vacancies in the In 2 O 3 lattice, whose density can be controlled by high-temperature annealing. The product of the Pt-deposition reaction inside the hollow silica nanoparticle, bearing In 2 O 3 -supported Pt catalysts inside the cavity protected by a porous silica shell, was proved to be an effective nanoreactor system which selectively and sustainably catalyzed the reduction reaction of small-sized aromatic nitro-compounds. Moreover, the surfactant-free and electroless Pt deposition protocol, which was devised based on the surface chemistry of the In 2 O 3 nanoparticles, was successfully employed to fabricate Pt-catalyst-modified ITO electrodes with enhanced electrogenerated chemiluminescece (ECL) performance.