Geometrical Design Schemes for the 2T0C DRAM Cell Using a Vertical Stack Transistor with a Distinctive Single IGZO Active Layer

In order to implement a three-dimensional (3D) 2-transistor-0-capacitor (2T0C) DRAM cell using a thermally sensitive InGaZnO (IGZO) channel, the impact of electrical interactions between the write transistor (WTr) and the read transistor (RTr) in a novel structure was investigated, and a control methodology was established. First, the adoption of a discrete active island pattern led to the suppression of parasitic channels. As a result, the subthreshold hump was eliminated, and an excellent subthreshold swing characteristic of 154.4 mV dec –1 was achieved. Second, memory characterization revealed that electrical coupling effects resulting from parasitic capacitance and electrostatic effects in the 3D stacked structure compromise the storage node voltage ( V SN ) charging efficiency. These can be attributed to the extended BE, which serves to reduce the device footprint, and the voltage applied to activate the RTr to read the V SN value, respectively. Finally, the strategic placement of the asymmetric S/D electrodes in the vertical-channel thin-film transistor ensured excellent operational stability with an SN variation below 0.03 V after 1000 s. Consequently, long-term linear multilevel operation of 3 bits was achieved under various write operation conditions.