journal article·2021-05-05Open access

Turning Low-Nanoscale Intrinsic Silicon Highly Electron-Conductive by SiO2 Coating

Dirk König, Michael Frentzen, Noël Wilck, Birger Berghoff, Igor Píš, Silvia Nappini, Federica Bondino, Merlin Müller, Sara Gonzalez, Giovanni Di Santo, Luca Petaccia, Joachim Mayer, Sean Smith, Joachim Knoch

ACS Applied Materials & Interfaces· Volume 13· Issue 17

Abstract

-coated Si nanowells shift by up to 0.2 eV below the conduction band and ca. 0.7 eV below the valence band edge of bulk silicon, respectively. This nanoscale electronic structure shift induced by anions at surfaces (NESSIAS) provides the means for low-nanoscale intrinsic Si (i-Si) to be flooded by electrons from an external (bigger, metallic) reservoir, thereby getting highly electron- (n-) conductive. While our findings deviate from the behavior commonly believed to govern the properties of silicon nanowells, they are further confirmed by the fundamental energy gap as per nanowell thickness when compared against published experimental data. Supporting our findings further with hybrid density functional theory calculations, we show that other group IV semiconductors (diamond, Ge) do respond to the NESSIAS effect in accord with Si. We predict adequate nanowire cross-sections (X-sections) from experimental nanowell data with a recently established crystallographic analysis, paving the way to undoped ultrasmall silicon electronic devices with significantly reduced gate lengths, using complementary metal-oxide-semiconductor-compatible materials.
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Research context

OpenAlex topics: Semiconductor materials and devices · Nanowire Synthesis and Applications · Electronic and Structural Properties of Oxides

SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.

Affiliations

Integrated Materials Design Laboratory (IMDL), The Australian National University, Canberra, Australian Capital Territory 2601, Australia

Smart Materials and Surface Group, University of New South Wales, Sydney, New South Wales 2052, Australia

Institute of Semiconductor Electronics (IHT), RWTH Aachen University, Aachen 52074, Germany

Laboratorio TASC, IOM-CNR, Area Science Park S.S. 14 km 163.5, Trieste 34149, Italy

Central Facility for Electron Microscopy, RWTH Aachen University, Aachen 52074, Germany

Ametek GmbH, BU Gatan, Ingolstädter Straße 12, Munich 80807, Germany

Elettra Sincrotrone Trieste, Strada Statale 14 km 163.5, Trieste 34149, Italy

Department of Applied Mathematics, Research School of Physics and Engineering, The Australian National University, Canberra, Australian Capital Territory 2601, Australia

Funding

Deutscher Akademischer Austauschdienst · Ministero dell???Istruzione, dell???Universit?? e della Ricerca · RWTH Aachen University · Helmholtz Association · German Research Foundation

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