Charge Storage of Isolated Monolayer Molybdenum Disulfide in Epitaxially Grown MoS₂/Graphene Heterostructures for Memory Device Applications

We epitaxially grew bilayer molybdenum disulfide (MoS2) on monolayer graphene by sulfurizing a molybdenum-trioxide film (MoO3) which was deposited with thermal evaporation. The Hall mobilities of graphene before and after the growth of MoS2 are similar, indicating that the underlying 2D layer was little affected during the deposition and sulfurization. Through the atomic-layer etching, the topmost layer of MoS2 is isolated from the source and drain electrodes. The top-gate transistor with the isolated monolayer MoS2 on top of the graphene channel exhibits hysteresis of drain current as the gate voltage varies. This may be due to the weak tunneling through 2D layers bonded by the van der Waals force in the absence of an external electric field. The long retention time of the device features robust charge storage around the isolated MoS2 layer. The one-transistor-zero-capacitor memory module based on this thin heterostructure of 2D materials can be advantageous for applications in dynamic random access memories with reduced thickness.