Mitigating Meniscus Instabilities in Solution-Sheared Polymer Films for Organic Field-Effect Transistors
Source abstract
Abstract
Semiconducting donor-acceptor copolymers are considered to be a promising material class for solution-coated, large-scale organic electronic applications. A large number of works have shown that the best-performing organic field-effect transistors (OFETs) are obtained on low-surface-energy substrates. The meniscus instabilities that occur when coating on such surfaces considerably limit the effective deposition speeds. This represents a limiting factor for the upscaling of device fabrication for mass production, an issue that needs to be addressed if organic electronic devices are ever to become commercially relevant. In this work, we present a method to increase the accessible window of coating speeds for the solution shearing of donor-acceptor semiconductor polymers for the fabrication of OFETs. By incorporating a piezo crystal that is capable of producing high-frequency vibrations into the coating head, we are able to mitigate contact line instabilities due to the depinning of the contact line, thereby suppressing the commonly encountered "stick-and-slip" phenomenon.
Source: openalex_inverted_index · Quality: baseline
Research context
OpenAlex topics: Organic Electronics and Photovoltaics · Advanced Sensor and Energy Harvesting Materials · Thin-Film Transistor Technologies
SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.
Affiliations
Department of Chemical and Biomolecular Engineering, University of Illinois Urbana−Champaign, 600 S. Mathews Avenue, Urbana, Illinois 61801, United States
Institute of Fluid Dynamics, Helmholtz-Zentrum Dresden-Rossendorf (HZDR), Bautzner Landstraße 400, Dresden 01328, Germany
Funding
Deutsche Forschungsgemeinschaft · Division of Materials Research · Center for Advancing Electronics Dresden, Dresden University of Technology · Graduate Academy, Dresden University of Technology
References (66)
Show source-provided references
1. 10.1002/adfm.20040031510.1002/adfm.200400315 ↗
2. 10.1002/polb.2395210.1002/polb.23952 ↗
3. 10.1002/adma.20100189210.1002/adma.201001892 ↗
4. 10.1021/la100547j10.1021/la100547j ↗
5. 10.1021/la900315h10.1021/la900315h ↗
6. 10.1038/s41467-018-02835-710.1038/s41467-018-02835-7 ↗
7. 10.1016/j.cis.2013.11.00210.1016/j.cis.2013.11.002 ↗
8. 10.1038/ncomms1245810.1038/ncomms12458 ↗
9. 10.1021/la803646e10.1021/la803646e ↗
10. 10.1021/la202040x10.1021/la202040x ↗
11. 10.1088/1361-6528/aa9d7c10.1088/1361-6528/aa9d7c ↗
12. 10.1021/acsami.8b1379010.1021/acsami.8b13790 ↗
13. 10.1021/la703270c10.1021/la703270c ↗
14. 10.1021/la00003a05710.1021/la00003a057 ↗
15. 10.1163/156856192X0081810.1163/156856192X00818 ↗
16. 10.1103/PhysRevLett.100.04450310.1103/PhysRevLett.100.044503 ↗
17. 10.1063/1.181020510.1063/1.1810205 ↗
18. 10.1038/nmat110510.1038/nmat1105 ↗
19. 10.1039/C8TC06255B10.1039/C8TC06255B ↗
20. 10.1002/adfm.20180414210.1002/adfm.201804142 ↗
21. 10.1021/acs.langmuir.7b0280710.1021/acs.langmuir.7b02807 ↗
22. 10.1016/j.synthmet.2013.09.02010.1016/j.synthmet.2013.09.020 ↗
23. 10.1002/adfm.20080172710.1002/adfm.200801727 ↗
24. 10.1021/ja902995710.1021/ja9029957 ↗
25. 10.1038/nature0337610.1038/nature03376 ↗
26. 10.1039/c000172d10.1039/c000172d ↗
27. 10.1039/c2sm26574e10.1039/c2sm26574e ↗
28. 10.1209/0295-5075/83/3400510.1209/0295-5075/83/34005 ↗
29. 10.1038/ncomms895510.1038/ncomms8955 ↗
30. 10.1021/la202673610.1021/la2026736 ↗
31. 10.1038/3982710.1038/39827 ↗
32. 10.1021/la951021n10.1021/la951021n ↗
33. Marmur A. · J. Imaging Sci. Technol. · 2000 · 44 · 40610.2352/J.ImagingSci.Technol.2000.44.5.art00005 ↗
34. 10.1063/1.44733710.1063/1.447337 ↗
35. 10.1016/0021-9797(77)90114-X10.1016/0021-9797(77)90114-X ↗
36. 10.1016/S0927-7757(99)00069-210.1016/S0927-7757(99)00069-2 ↗
37. 10.1016/j.jcis.2004.02.03610.1016/j.jcis.2004.02.036 ↗
38. 10.1007/s00396-012-2796-610.1007/s00396-012-2796-6 ↗
39. 10.1103/PhysRevLett.65.188510.1103/PhysRevLett.65.1885 ↗
40. 10.1021/la00019a01010.1021/la00019a010 ↗
41. 10.1098/rstl.1805.000510.1098/rstl.1805.0005 ↗
42. 10.1039/C0SM00939C10.1039/C0SM00939C ↗
43. 10.1039/c1sm06196h10.1039/c1sm06196h ↗
44. 10.1021/la201085810.1021/la2010858 ↗
45. 10.1016/S0927-7757(02)00072-910.1016/S0927-7757(02)00072-9 ↗
46. 10.1038/nature1068310.1038/nature10683 ↗
47. 10.1002/aic.1433810.1002/aic.14338 ↗
48. 10.1038/ncomms1607010.1038/ncomms16070 ↗
49. 10.1021/acs.chemmater.7b0483510.1021/acs.chemmater.7b04835 ↗
50. 10.1016/j.orgel.2016.06.00310.1016/j.orgel.2016.06.003 ↗
51. 10.1002/adma.20160698710.1002/adma.201606987 ↗
52. 10.1016/j.orgel.2013.06.03210.1016/j.orgel.2013.06.032 ↗
53. 10.1063/1.219703310.1063/1.2197033 ↗
54. 10.1063/1.280428810.1063/1.2804288 ↗
55. 10.1126/sciadv.aao575810.1126/sciadv.aao5758 ↗
56. 10.1126/sciadv.170118610.1126/sciadv.1701186 ↗
57. 10.1021/cr300110910.1021/cr3001109 ↗
58. 10.1038/4435910.1038/44359 ↗
59. 10.1038/ncomms1090810.1038/ncomms10908 ↗
60. 10.1002/adma.20150313310.1002/adma.201503133 ↗
61. 10.1038/nmat503510.1038/nmat5035 ↗
62. 10.1002/aelm.20180007610.1002/aelm.201800076 ↗
63. 10.1002/aelm.20180014110.1002/aelm.201800141 ↗
64. 10.1063/1.16640710.1063/1.166407 ↗
65. 10.1002/adma.20110278610.1002/adma.201102786 ↗
66. 10.1021/ja077300210.1021/ja0773002 ↗