journal article·2022-05-25

Direct Patterning of Optoelectronic Nanostructures Using Encapsulated Layered Transition Metal Dichalcogenides

Teodor K. Stanev, Pufan Liu, Hongfei Zeng, Erik J. Lenferink, Akshay A. Murthy, Nathaniel Speiser, Kenji Watanabe, Takashi Taniguchi, Vinayak P. Dravid, Nathaniel P. Stern

ACS Applied Materials & Interfaces· Volume 14· Issue 20
Publisher page

Abstract

Direct top-down nanopatterning of semiconductors is a powerful tool for engineering properties of optoelectronic devices. Translating this approach to two-dimensional semiconductors such as monolayer transition metal dichalcogenides (TMDs) is challenging because of both the small scales required for confinement and the degradation of electronic and optical properties caused by high-energy and high-dose electron radiation used for high-resolution top-down direct electron beam patterning. We show that encapsulating a TMD monolayer with hexagonal boron nitride preserves the narrow exciton linewidths and emission intensity typical in such heterostructures after electron beam lithography, allowing direct patterning of functional optical monolayer nanostructures on scales of a few tens of nanometers. We leverage this fabrication method to study size-dependent effects on nanodot arrays of MoS2 and MoSe2 as well as laterally confined electrical transport devices, demonstrating the potential of top-down lithography for nanoscale TMD optoelectronics.
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Research context

OpenAlex topics: 2D Materials and Applications · Quantum Dots Synthesis And Properties · Perovskite Materials and Applications

SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.

Affiliations

Department of Physics and Astronomy, Northwestern University, Evanston, Illinois 60208, United States

Department of Materials Science and Engineering, Northwestern University, Evanston, Illinois 60208, United States

Research Center for Functional Materials, National Institute for Materials Science, 1-1 Namiki, Tsukuba 305-0044, Japan

International Center for Materials Nanoarchitectonics, National Institute for Materials Science, 1-1 Namiki, Tsukuba 305-0044, Japan

International Institute for Nanotechnology (IIN), Northwestern University, Evanston, Illinois 60208, United States

Northwestern University Atomic and Nanoscale Characterization Experimental (NUANCE) Center, Northwestern University, Evanston, Illinois 60208, United States

Funding

Ministry of Education, Culture, Sports, Science and Technology · Office of Naval Research · Japan Society for the Promotion of Science · Northwestern University · Division of Materials Research

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