journal article·2025-01-08

Metal–Organic Framework-Based NF3 Nanotrap for the Separation of NF3 and CF4

Zi-Wen Fan, Yue Wang, Jieyu Liu, Zi-Tong Cheng, Changhong Wang, Zheng Niu

Publisher page

Abstract

As an electronic specialty gas, nitrogen trifluoride (NF 3 ) has been widely used in the semiconductor, photovoltaic, and display industries. However, NF 3 in industrial settings is typically mixed with CF 4, and the distillation method commonly used for their separation consumes significant energy. Herein, we propose a novel NF 3 nanoadsorber featuring relatively proximal unsaturated metal sites. The potential field overlap between the two unsaturated metal centers creates an NF 3 -affinitive environment. The adsorption mechanism of NF 3 molecules in the metal–organic frameworks (MOFs) was investigated through density functional theory (DFT) optimization. The results from ideal adsorbed solution theory (IAST) calculations and breakthrough experiments reveal that the MOF-based NF 3 nanotrap possesses the highest adsorption capacity and excellent NF 3 /CF 4 selectivity among the physically adsorptive materials reported to date. This work presents a novel solution for the separation and purification of NF 3, contributing to the field of gas separation technology.
Source: openalex_inverted_index · Quality: baseline

Research context

OpenAlex topics: Metal-Organic Frameworks: Synthesis and Applications · Gas Sensing Nanomaterials and Sensors · Inorganic Fluorides and Related Compounds

SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.

Affiliations

College of Chemistry, Chemical Engineering and Materials Science, Soochow University, Suzhou 215123, China

Hebei Normal University, Shijiazhuang 050024, Hebei, China

Lingnan College, Sun Yat-sen University, Guangzhou 510275, China

Funding

National Natural Science Foundation of China · Gusu Innovation Leading Talents Program · "Distinguished Professor of Jiangsu Province" Program

References (27)

Show source-provided references
1. 10.1029/2008GL03591310.1029/2008GL035913 ↗
2. 10.1016/j.jfluchem.2006.02.00610.1016/j.jfluchem.2006.02.006 ↗
3. 10.1016/j.jfluchem.2006.11.00710.1016/j.jfluchem.2006.11.007 ↗
4. 10.1149/1.212735110.1149/1.2127351 ↗
5. 10.1016/j.jtice.2021.10417810.1016/j.jtice.2021.104178 ↗
6. 10.1021/acsami.3c0539810.1021/acsami.3c05398 ↗
7. Mahler, B. A.; Miller, R. N.; Kao, C.P. C. Process for Purifying Perfluorinated Products, Especially Nitrogen Trifluoride for the Electronics Industry. WO Patent WO9924358A11999.
8. Shiflett, M. B.; Yokozeki, A. Process for Purifying Perfluorinated Products by Extractive Distillation or Absorption. WO Patent WO2007143055A22007.
9. 10.1016/j.memsci.2014.03.03310.1016/j.memsci.2014.03.033 ↗
10. Igumnov, S. M.; Kharitonov, V. P. Gaseous Nitrogen Trifluoride Purification Method. RU Patent RU2206499C12003.
11. Igumnov, S. M.; Kharitonov, V. P. Method of Purifying Gaseous Nitrogen Trifluoride. US Patent US7,022,1602006.
12. Park, Y.C.; Jeong, W.S.; Hyun, K.C.; Lee, J.W.; Kwon, I.H. Purification of Nitrogen Trifluoride Gas Using Alkaline Earth-Exchanged and Impregnated Zeolite. WO Patent WO2006006792A12006.
13. Park, Y.C.; Jeong, W.S.; Hyun, K.C.; Lee, J.w.; Kwon, I.H. Process for Refining Nitrogen Trifluoride Gas Using Alkali Earth Metal Exchanged and Impregnated Zeolit. US Patent US7,637,9862009.
14. 10.1016/j.enchem.2019.10000610.1016/j.enchem.2019.100006 ↗
15. 10.1016/j.chempr.2019.10.01210.1016/j.chempr.2019.10.012 ↗
16. 10.1002/adma.20200260310.1002/adma.202002603 ↗
17. 10.1002/adma.20170518910.1002/adma.201705189 ↗
18. 10.1016/j.seppur.2022.12073910.1016/j.seppur.2022.120739 ↗
19. 10.1021/acsami.2c1216410.1021/acsami.2c12164 ↗
20. 10.1021/cbe.3c0009610.1021/cbe.3c00096 ↗
21. 10.1021/acs.iecr.2c0160410.1021/acs.iecr.2c01604 ↗
22. 10.1039/D3SC02313C10.1039/D3SC02313C ↗
23. 10.1039/C9CS00609E10.1039/C9CS00609E ↗
24. 10.1002/anie.20201622510.1002/anie.202016225 ↗
25. 10.1021/acsami.2c1719610.1021/acsami.2c17196 ↗
26. 10.1021/jacs.3c1203210.1021/jacs.3c12032 ↗
27. 10.1002/adma.20190827510.1002/adma.201908275 ↗