Importance of Solvent Removal Rate on the Morphology and Device Performance of Organic Photovoltaics with Solvent Annealing
Source abstract
Abstract
Solvent vapor annealing has been widely used in organic photovoltaics (OPV) to tune the morphology of bulk heterojunction active layer for the improvement of device performance. Unfortunately, the effect of solvent removal rate (SRR) after solvent annealing, which is one of the key factors that impact resultant morphology, on the morphology and device performance of OPV has never been reported. In this work, the nanoscale morphology of small molecule (SM):fullerene bulk heterojunction (BHJ) solar cell from different SRRs after solvent annealing was examined by small-angle neutron scattering and grazing incidence X-ray scattering. The results clearly demonstrate that the nanoscale morphology of SM:fullerene BHJ especially fullerene phase separation and concentration of fullerene in noncrystalline SM was significantly impacted by the SRR. The enhanced fullerene phase separation was found with a decrease of SRR, while the crystallinity and molecular packing of SM remained unchanged. Correlation to device performance shows that the balance between pure fullerene phase and mixing phase of SM and fullerene is crucial for the optimization of morphology and enhancement of device performance. Moreover, the specific interfacial area between pure fullerene phase and mixing phase is crucial for the electron transport and thus device performance. More importantly, this finding would provide a more careful and precise control of morphology of SM:fullerene BHJ and offers a guideline for further improvement of device performance with solvent annealing.
Source: openalex_inverted_index · Quality: baseline
Research context
OpenAlex topics: Organic Electronics and Photovoltaics · Conducting polymers and applications · Perovskite Materials and Applications
SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.
Affiliations
Institute of Optoelectronic Display, National & Local United Engineering Lab of Flat Panel Display Technology, Fuzhou University, Fuzhou 350002, China
College of Information Science and Engineering, Fujian University of Technology, Fuzhou 350108, China
Key Laboratory of Neutron Physics and Institute of Nuclear Physics and Chemistry, China Academy of Engineering Physics, Mianyang 621900, China
Funding
Ministry of Science and Technology of the People's Republic of China · National Natural Science Foundation of China
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