journal article·2019-11-06

Ultralow-Noise Organic Transistors Based on Polymeric Gate Dielectrics with Self-Assembled Modifiers

Masaya Kondo, Takafumi Uemura, Fumitaka Ishiwari, Takashi Kajitani, Yoshiaki Shoji, Masato Morita, Naoko Namba, Yumi Inoue, Yuki Noda, Teppei Araki, Takanori Fukushima, Tsuyoshi Sekitani

ACS Applied Materials & Interfaces· Volume 11· Issue 44
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Abstract

In this study, ultralow 1/f noise organic thin-film transistors (OTFTs) based on parylene gate dielectrics modified with triptycene (Trip) modifiers were fabricated. The fabricated OTFTs showed the lowest 1/f noise level among those of previously reported OTFTs. It is well known that 1/f noise causes degradation of signal integrity in analog and digital circuits. However, conventional OTFTs still possess high 1/f noise levels, and the factors that strongly affect 1/f noise are still ambiguous. In this work, the effect of gate dielectric surface on 1/f noise was investigated. First, by comparing OTFTs composed of various channel lengths, we revealed that contact resistance did not affect 1/f noise. Second, we compared parylene OTFTs with and without a self-assembled Trip modifier layer in terms of 1/f noise and trap density of states (Trap DOS). The experiments revealed that a specific Trip modifier layer suppresses the shallow Trap DOS in the OTFTs, leading to a low 1/f noise. Moreover, the 1/f noise level and Trap DOS of various kinds of OTFTs were comprehensively compared, which highlighted that the 1/f noise of OTFTs strongly depends on the gate dielectric surface. Finally, detailed analysis of the gate dielectric interface led us to conclude that the disorder of gate dielectrics and the crystalline quality of semiconductor films are related to shallow Trap DOS, which correlates with 1/f noise.
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Research context

OpenAlex topics: Advanced Memory and Neural Computing · Neuroscience and Neural Engineering · Organic Electronics and Photovoltaics

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Affiliations

The Institute of Scientific and Industrial Research, Osaka University, 8-1, Mihogaoka, Ibaraki, Osaka 567-0047, Japan

Graduate School of Engineering, Osaka University, 2-1, Yamada-oka, Suita, Osaka 565-0871, Japan

Advanced Photonics and Biosensing Open Innovation Laboratory, National Institute of Advanced Industrial Science and Technology, Photonics Center P3 Bldg. 2-1, Yamadaoka, Suita, Osaka 565-0871, Japan

Laboratory for Chemistry and Life Science, Institute of Innovative Research, Tokyo Institute of Technology, 4259 Nagatsuta, Midori-ku, Yokohama 226-8503, Japan

Funding

New Energy and Industrial Technology Development Organization · Ministry of Education, Culture, Sports, Science and Technology · Japan Society for the Promotion of Science · Japan Science and Technology Agency · National Institute for Materials Science · National Institute of Advanced Industrial Science and Technology

References (53)

Show source-provided references
1. 10.1126/science.120615710.1126/science.1206157 ↗
2. 10.1021/acsami.5b0233610.1021/acsami.5b02336 ↗
3. 10.1038/nature2549410.1038/nature25494 ↗
4. 10.1021/acsami.8b1905110.1021/acsami.8b19051 ↗
5. 10.1021/nl101559n10.1021/nl101559n ↗
6. 10.1021/nn403248y10.1021/nn403248y ↗
7. 10.1038/s41565-017-0018-610.1038/s41565-017-0018-6 ↗
8. 10.1038/nature1231410.1038/nature12314 ↗
9. 10.1016/j.orgel.2011.04.01810.1016/j.orgel.2011.04.018 ↗
10. 10.1021/am301793m10.1021/am301793m ↗
11. 10.1021/cm504318310.1021/cm5043183 ↗
12. 10.1021/acsami.7b0323210.1021/acsami.7b03232 ↗
13. 10.1021/acsami.8b0662510.1021/acsami.8b06625 ↗
14. 10.1021/acsaelm.8b0008810.1021/acsaelm.8b00088 ↗
15. 10.1038/s41467-019-09119-810.1038/s41467-019-09119-8 ↗
16. 10.1109/tns.2015.240585210.1109/tns.2015.2405852 ↗
17. 10.1021/acsami.6b1586210.1021/acsami.6b15862 ↗
18. 10.1021/acsami.8b0019310.1021/acsami.8b00193 ↗
19. 10.1109/16.33380910.1109/16.333809 ↗
20. 10.1038/s42005-018-0037-010.1038/s42005-018-0037-0 ↗
21. 10.1063/1.290350810.1063/1.2903508 ↗
22. 10.1063/1.282357710.1063/1.2823577 ↗
23. 10.1063/1.349599810.1063/1.3495998 ↗
24. 10.1063/1.485893510.1063/1.4858935 ↗
25. 10.1109/led.2013.227761310.1109/led.2013.2277613 ↗
26. 10.1109/16.93669010.1109/16.936690 ↗
27. 10.1063/1.299585610.1063/1.2995856 ↗
28. 10.1063/1.37235410.1063/1.372354 ↗
29. 10.1063/1.481610310.1063/1.4816103 ↗
30. 10.1063/1.346705710.1063/1.3467057 ↗
31. 10.1016/j.sse.2011.01.00210.1016/j.sse.2011.01.002 ↗
32. 10.1126/science.aav705710.1126/science.aav7057 ↗
33. 10.1126/science.aab139110.1126/science.aab1391 ↗
34. 10.1002/pssa.20122821910.1002/pssa.201228219 ↗
35. 10.7567/apex.9.06160210.7567/apex.9.061602 ↗
36. 10.1021/acs.jpcc.5b0553310.1021/acs.jpcc.5b05533 ↗
37. 10.1063/1.181504210.1063/1.1815042 ↗
38. McWhorter A. L. · 1957 · 207
39. 10.1016/0038-1101(89)90113-510.1016/0038-1101(89)90113-5 ↗
40. 10.1002/pssa.221124022510.1002/pssa.2211240225 ↗
41. 10.1073/pnas.170516411410.1073/pnas.1705164114 ↗
42. 10.1038/nmat177410.1038/nmat1774 ↗
43. 10.1038/am.2016.3010.1038/am.2016.30 ↗
44. 10.1002/adfm.20039003010.1002/adfm.200390030 ↗
45. 10.1002/adfm.20080172710.1002/adfm.200801727 ↗
46. 10.1002/adma.20100150210.1002/adma.201001502 ↗
47. 10.1063/1.493031010.1063/1.4930310 ↗
48. 10.1002/adma.20130088610.1002/adma.201300886 ↗
49. 10.1021/ma951155810.1021/ma9511558 ↗
50. Hammersley, A. The FIT2D Home Page. (European Synchrotron Radiation Facility), 2015. http://www.esrf.eu/computing/scientific/FIT2D/.
51. 10.5940/jcrsj.45.14510.5940/jcrsj.45.145 ↗
52. 10.1080/1364281880821122910.1080/13642818808211229 ↗
53. 10.1103/physrevb.81.03532710.1103/physrevb.81.035327 ↗