Selection of a Suitable Solvent Additive for 2-Methoxyethanol-Based Antisolvent-Free Perovskite Film Fabrication

In this study, we compare various solvents with different Gutmann donor numbers as additives to improve the quality of perovskite films via an antisolvent-free process, using 2-methoxyethanol (2MOE) as the solvent. In 2MOE-based solutions, we found that the higher the donor number of the solvent, the lower the amount of the solvent required to form insoluble adducts. Furthermore, we found that N-methyl-2-pyrrolidone (NMP), which has a relatively low donor number and vapor pressure, can be added without a limitation to precipitation, while the degree of the intermediate phase in the as-deposited film is controlled by the amount of NMP added. We obtained pinhole-free and planar perovskite films by optimizing the amount of NMP added and fabricated devices based on NMP-assisted MAPbI3 and MAPbI3–xClx films, with efficiencies of 18.80 and 20.39%, respectively.