journal article·2020-10-07

Ferroelectric-Modulated MoS2 Field-Effect Transistors as Multilevel Nonvolatile Memory

Liping Xu, Zhihua Duan, Peng Zhang, Xiang Wang, Jinzhong Zhang, Liyan Shang, Kai Jiang, Yawei Li, Liangqing Zhu, Yongji Gong, Zhigao Hu, Junhao Chu

ACS Applied Materials & Interfaces· Volume 12· Issue 40
Publisher page

Abstract

Ferroelectric field-effect transistors (FeFETs) with semiconductors as the channel material and ferroelectrics as the gate insulator are attractive and/or promising devices for application in nonvolatile memory. In FeFETs, the conductivity states of the semiconductor are utilized to explore the polarization directions of the ferroelectric material. Herein, we report FeFETs based on a few layers of MoS2 on a 0.7Pb(Mg1/3Nb2/3)O3–0.3PbTiO3 (PMN–PT) single crystal with switchable multilevel states. It was found that the On–Off ratios can reach as high as 106. We prove that the interaction effect of ferroelectric polarization and interface charge traps has a great influence on the transport behaviors and nonvolatile memory characteristics of MoS2/PMN–PT FeFETs. In order to further study the underlying physical mechanism, we have researched the time-dependent electrical properties in the temperature range from 300 to 500 K. The separation of effects from ferroelectric polarization and interfacial traps on electrical behaviors of FeFETs provides us with an opportunity to better understand the operation mechanism, which suggests a fantastic way for multilevel, low-power consumption, and high-density nonvolatile memory devices.
Source: openalex_inverted_index · Quality: baseline

Research context

OpenAlex topics: 2D Materials and Applications · Ferroelectric and Negative Capacitance Devices · MXene and MAX Phase Materials

SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.

Affiliations

Technical Center for Multifunctional Magneto-Optical Spectroscopy (Shanghai), Engineering Research Center of Nanophotonics & Advanced Instrument (Ministry of Education), Department of Materials, School of Physics and Electronic Science, East China Normal University, Shanghai 200241, China

Key Laboratory of Optoelectronic Material and Device, Department of Physics, Shanghai Normal University, Shanghai 200234, China

School of Materials Science & Engineering, Beihang University, Beijing 100191, China

Collaborative Innovation Center of Extreme Optics, Shanxi University, Taiyuan, Shanxi 030006, China

Shanghai Institute of Intelligent Electronics & Systems, Fudan University, Shanghai 200433, China

Funding

Ministry of Science and Technology of the People's Republic of China · Shanghai Municipal Education Commission · Science and Technology Commission of Shanghai Municipality · National Natural Science Foundation of China

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