journal article·2017-02-22Open access

Controlled Charging of Ferroelastic Domain Walls in Oxide Ferroelectrics

Xian-Kui Wei, Tomas Sluka, Barbara Fraygola, Ludwig Feigl, Hongchu Du, Lei Jin, Chun-Lin Jia, Nava Setter

Abstract

Conductive domain walls (DWs) in ferroic oxides as device elements are a highly attractive research topic because of their robust and agile response to electric field. Charged DWs possessing metallic-type conductivity hold the highest promises in this aspect. However, their intricate creation, low stability, and interference with nonconductive DWs hinder their investigation and the progress toward future applications. Here, we find that conversion of the nominally neutral ferroelastic 90° DWs into partially charged DWs in Pb(Zr 0.1 Ti 0.9 )O 3 thin films enables easy and robust control over the DW conductivity. By employing transmission electron microscopy, conductive atomic force microscopy and phase-field simulation, our study reveals that charging of the ferroelastic DWs is controlled by mutually coupled DW bending, type of doping, polarization orientation and work-function of the adjacent electrodes. Particularly, the doping outweighs other parameters in controlling the DW conductivity. Understanding the interplay of these key parameters not only allows us to control and optimize conductivity of such ferroelastic DWs in the oxide ferroelectrics but also paves the way for utilization of DW-based nanoelectronic devices in the future.
Source: openalex_inverted_index · Quality: baseline

Research context

OpenAlex topics: Ferroelectric and Piezoelectric Materials · Multiferroics and related materials · Electronic and Structural Properties of Oxides

SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.

Affiliations

Ceramics Laboratory, EPFL-Swiss Federal Institute of Technology, Lausanne 1015, Switzerland

Peter Grünberg Institute and Ernst Ruska-Center for Microscopy and Spectroscopy with Electrons, Forschungszentrum Jülich, 52425 Jülich, Germany

Institute for Photon Science and Synchrotron Radiation, KIT - Karlsruhe Institute of Technology, Hermann-von-Helmholtz-Platz 1, D-76344 Eggenstein-Leopoldshafen, Germany

Central Facility for Electron Microscopy (GFE), RWTH Aachen University, Aachen 52074, Germany

The School of Electronic and Information Engineering, Xi’an Jiaotong University, Xi’an 710049, China

Department of Materials Science and Engineering, Tel-Aviv University, Ramat Aviv 69978, Israel

Funding

European Research Council

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