journal article·2013-03-27

High-Performance Triethylsilylethynyl Anthradithiophene Transistors Prepared without Solvent Vapor Annealing: The Effects of Self-Assembly during Dip-Coating

Sooji Nam, Jaeyoung Jang, John. E. Anthony, Jong-Jin Park, Chan Eon Park, Kinam Kim

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Abstract

Solution-processable small-molecule organic semiconductors have recently attracted significant attention for use as the active channel layers in organic field-effect transistors due to their good intrinsic charge carrier mobility and easy processability. Dip-coating is a good method for optimizing the film morphology and molecular ordering of the small-molecular semiconductors because the drying speed can be quantitatively controlled at the air-solution-substrate contact line. Here, we report the preparation of highly crystalline triethylsilylethynyl-anthradithiophene (TES-ADT) crystal arrays that exhibit an excellent field-effect mobility (up to 1.8 cm(2)/(V s)) via an optimized one-step dip-coating process. High-quality TES-ADT crystals were grown without solvent vapor annealing postprocessing steps, which were previously thought to be essential for improving the morphology, crystallinity, and electrical characteristics of TES-ADT thin films. An interesting correlation between the optimal pull-out rate and the self-assembly tendencies of some soluble acene semiconductors was observed, and the origin of the correlation was investigated. Our work demonstrates an alternative simple approach to achieving highly crystalline TES-ADT thin films, and further proposes a prospective method for optimizing the formation of thin films via the molecular self-assembly of soluble acenes.
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Research context

OpenAlex topics: Organic Electronics and Photovoltaics · Molecular Junctions and Nanostructures · Advanced Memory and Neural Computing

SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.

Affiliations

Postech Organic Electronics Laboratory, Polymer Research Institute, Department of Chemical Engineering, Pohang University of Science and Technology (POSTECH), Pohang, 790-784, Republic of Korea

Department of Chemistry, University of Kentucky, Lexington, Kentucky, 40506, United States

Samsung Advanced Institute of Technology (SAIT), Yongin, 449-712, Republic of Korea

References (43)

Show source-provided references
1. Dimitrakopoulos C. D. · Adv. Mater. · 2002 · 14 · 9910.1002/1521-4095(20020116)14:2<99::AID-ADMA99>3.0.CO;2-9 ↗
2. Braga D. · Adv. Mater. · 2009 · 21 · 147310.1002/adma.200802733 ↗
3. Gundlach D. J. · Nat. Mater. · 2008 · 7 · 21610.1038/nmat2122 ↗
4. Park S. K. · Appl. Phys. Lett. · 2008 · 93 · 04330110.1063/1.2952769 ↗
5. Kim S. H. · Appl. Phys. Lett. · 2008 · 93 · 11330610.1063/1.2987419 ↗
6. Lim J. A. · Adv. Funct. Mater. · 2008 · 18 · 22910.1002/adfm.200700859 ↗
7. Sele C. W. · Adv. Mater. · 2009 · 21 · 492610.1002/adma.200901548 ↗
8. Park S. K. · Appl. Phys. Lett. · 2007 · 91 · 06351410.1063/1.2768934 ↗
9. Kim Y.-H. · J. Electrochem. Soc. · 2007 · 154 · H99510.1149/1.2783765 ↗
10. Park K. · Chem. Mater. · 2010 · 22 · 537710.1021/cm1018234 ↗
11. Pisula W. · Adv. Mater. · 2005 · 17 · 68410.1002/adma.200401171 ↗
12. Virkar A. A. · Adv. Mater. · 2010 · 22 · 385710.1002/adma.200903193 ↗
13. Nam S. · J. Mater. Chem. · 2012 · 22 · 554310.1039/c2jm15260f ↗
14. Dickey K. C. · Adv. Mater. · 2006 · 18 · 172110.1002/adma.200600188 ↗
15. Lee S. S. · Adv. Mater. · 2009 · 21 · 360510.1002/adma.200900705 ↗
16. Lee W. H. · Appl. Phys. Lett. · 2007 · 91 · 09210510.1063/1.2768885 ↗
17. Yu L. · Appl. Phys. Lett. · 2011 · 99 · 26330410.1063/1.3673280 ↗
18. Kim S. H. · Adv. Mater. · 2010 · 22 · 480910.1002/adma.201000904 ↗
19. Kim S. H. · Adv. Funct. Mater. · 2011 · 21 · 219810.1002/adfm.201002054 ↗
20. Jang J. · Adv. Funct. Mater. · 2012 · 22 · 100510.1002/adfm.201102284 ↗
21. Becerril H. A. · Adv. Mater. · 2008 · 20 · 258810.1002/adma.200703120 ↗
22. Duffy C. M. · Chem. Mater. · 2008 · 20 · 725210.1021/cm801689f ↗
23. Payne M. M. · J. Am. Chem. Soc. · 2005 · 127 · 498610.1021/ja042353u ↗
24. Fallahazad B. · Appl. Phys. Lett. · 2012 · 100 · 09311210.1063/1.3689785 ↗
25. Kim J. B. · Appl. Phys. Lett. · 2009 · 94 · 14210710.1063/1.3118575 ↗
26. Jang J. · J. Mater. Chem. · 2011 · 21 · 1254210.1039/c1jm11544h ↗
27. Rivnay J. · Nat. Mater. · 2009 · 8 · 95210.1038/nmat2570 ↗
28. Li L. · J. Am. Chem. Soc. · 2010 · 132 · 880710.1021/ja1017267 ↗
29. Cheng H. −L. · Adv. Func. Mater. · 2007 · 17 · 363910.1002/adfm.200700207 ↗
30. Gundlach D. J. · IEEE Electron Device Lett. · 1997 · 18 · 8710.1109/55.556089 ↗
31. Lee W. H. · Adv. Mater. · 2009 · 21 · 424310.1002/adma.200900277 ↗
32. Pernstich K. P. · J. Appl. Phys. · 2004 · 96 · 643110.1063/1.1810205 ↗
33. Deegan R. D. · Nature · 1997 · 389 · 82710.1038/39827 ↗
34. Lim J. A. · Langmuir · 2009 · 25 · 540410.1021/la804269q ↗
35. Platt A. D. · J. Phys. Chem. C · 2009 · 113 · 1400610.1021/jp904021p ↗
36. Ostroverkhova O. · J. Apply. Phys. · 2005 · 98 · 03370110.1063/1.1949711 ↗
37. Zhang C. · Adv. Mater. · 2008 · 20 · 171610.1002/adma.200703142 ↗
38. Huang J. · Angew. Chem., Int. Ed. · 2007 · 46 · 241410.1002/anie.200604789 ↗
39. Liu N. · Langmuir · 2009 · 25 · 66510.1021/la8036633 ↗
40. Jung B. G. · J. Electrochem. Soc. · 2009 · 156 · K8610.1149/1.3089364 ↗
41. Huang J. · Nat. Mater. · 2005 · 4 · 89610.1038/nmat1517 ↗
42. Cazabat A. M. · Nature · 1990 · 346 · 82410.1038/346824a0 ↗
43. Fitzgerald S. D. · Nature · 1994 · 367 · 45010.1038/367450a0 ↗