Influence of Surface States on the Evaluation of the Flat Band Potential of TiO₂

Flat band potential (Vfb) is one of the most important physical parameters to study and understand semiconductor materials. However, the influence of surface states on the evaluating Vfb of titanium oxide (TiO2) and other semiconductor materials through a Mott-Schottky plot is ignored. Our study indicated that the influence of surface states should be introduced into the corresponding equivalent circuit even when the kinetic process did not occur. Ignoring the influence of surface states would lead to an underestimation of the space charge capacitance. Our paper would be beneficial for accurate determination of Vfb of semiconductor materials. We anticipate that this preliminary study will open new perspectives in understanding the semiconductor-electrolyte interface.