journal article·2017-09-06

Contact Engineering of Molybdenum Ditelluride Field Effect Transistors through Rapid Thermal Annealing

Jiancui Chen, Zhihong Feng, Shuangqing Fan, Sigang Shi, Yuchen Yue, Wanfu Shen, Yuan Xie, Enxiu Wu, Chongling Sun, Jing Liu, Hao Zhang, Wei Pang, Dong Sun, Wei Feng, Yiyu Feng, Sen Wu, Daihua Zhang

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Abstract

Understanding and engineering the interface between metal and two-dimensional materials are of great importance to the research and development of nanoelectronics. In many cases the interface of metal and 2D materials can dominate the transport behavior of the devices. In this study, we focus on the metal contacts of MoTe 2 (molybdenum ditelluride) FETs (field effect transistors) and demonstrate how to use post-annealing treatment to modulate their transport behaviors in a controlled manner. We have also carried out low temperature and transmission electron microscopy studies to understand the mechanisms behind the prominent effect of the annealing process. Changes in transport properties are presumably due to anti-site defects formed at the metal–MoTe 2 interface under elevated temperature. The study provides more insights into MoTe 2 field effect devices and suggests guidelines for future optimizations.
Source: openalex_inverted_index · Quality: baseline

Research context

OpenAlex topics: 2D Materials and Applications · MXene and MAX Phase Materials · Graphene research and applications

SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.

Affiliations

International Center for Quantum Materials, School of Physics, Peking University, Beijing 100871, People’s Republic of China

Funding

State Administration of Foreign Experts Affairs · Ministry of Education of the People's Republic of China · Tianjin Municipality

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