journal article·2017-10-04

Hybrid WSe2–In2O3 Phototransistor with Ultrahigh Detectivity by Efficient Suppression of Dark Currents

Nan Guo, Fan Gong, Junku Liu, Yi Jia, Shaofan Zhao, Lei Liao, Meng Su, Zhiyong Fan, Xiaoshuang Chen, Wei Lu, Lin Xiao, Weida Hu

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Abstract

Photodetectors based on low-dimensional materials have attracted tremendous attention because of their high sensitivity and compatibility with conventional semiconductor technology. However, up until now, developing low-dimensional phototransistors with high responsivity and low dark currents over broad-band spectra still remains a great challenge because of the trade-offs in the potential architectures. In this work, we report a hybrid phototransistor consisting of a single In 2 O 3 nanowire as the channel material and a multilayer WSe 2 nanosheet as the decorating sensitizer for photodetection. Our devices show high responsivities of 7.5 × 10 5 and 3.5 × 10 4 A W –1 and ultrahigh detectivities of 4.17 × 10 17 and 1.95 × 10 16 jones at the wavelengths of 637 and 940 nm, respectively. The superior detectivity of the hybrid architecture arises from the extremely low dark currents and the enhanced photogating effect in the depletion regime by the unique design of energy band alignment of the channel and sensitizer materials. Moreover, the visible to near-infrared absorption properties of the multilayer WSe 2 nanosheet favor a broad-band spectral response for the devices. Our results pave the way for developing ultrahigh-sensitivity photodetectors based on low-dimensional hybrid architectures.
Source: openalex_inverted_index · Quality: baseline

Research context

OpenAlex topics: 2D Materials and Applications · Gas Sensing Nanomaterials and Sensors · Ga2O3 and related materials

SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.

Affiliations

Qian Xuesen Laboratory of Space Technology, China Academy of Space Technology, Beijing 100094, China

State Key Laboratory of Infrared Physics, Shanghai Institute of Technical Physics, Chinese Academy of Sciences, 500 Yutian Road, Shanghai 200083, China

Department of Physics and Key Laboratory of Artificial Micro- and Nano-Structures of Ministry of Education, Wuhan University, Wuhan 430072, China

Department of Electronic and Computer Engineering, The Hong Kong University of Science and Technology, Clear Water Bay, Kowloon, Hong Kong, China

Funding

National Natural Science Foundation of China · Chinese Academy of Sciences · State Key Laboratory of Low-Dimensional Quantum Physics, Tsinghua University · State Key Laboratory on Advanced Displays and Optoelectronics Technologies, Hong Kong University of Science and Technology · Center for 1D/2D Quantum Materials, Hong Kong University of Science and Technology · State Key Laboratory of Infrared Physics

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