journal article·2014-01-22

Tuning Electrical Properties in Amorphous Zinc Tin Oxide Thin Films for Solution Processed Electronics

R. Devi Chandra, Manohar Rao, Keke Zhang, Rajiv Ramanujam Prabhakar, Chen Shi, Jie Zhang, Subodh G. Mhaisalkar, Nripan Mathews

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Abstract

Solution processed zinc tin oxide (ZTO) thin film transistors (TFTs) were fabricated by varying the Zn/Sn composition. The addition of Sn to the zinc oxide (ZnO) films resulted in improved electrical characteristics, with devices of Zn0.7Sn0.3O composition showing the highest mobility of 7.7 cm(2)/(V s). An improvement in subthreshold swings was also observed, indicative of a reduction of the interfacial trap densities. Mobility studies at low temperature have been carried out, which indicated that the activation energy was reduced with Sn incorporation. Kelvin probe force microscopy was performed on the films to evaluate work function and correlated to the metal-semiconductor barrier indicating Zn0.7Sn0.3O films had the smallest barrier for charge injection. Organic-inorganic hybrid complementary inverters with a maximum gain of 10 were fabricated by integrating ZTO TFTs with poly-3-hexylthiophene (P3HT) transistors.
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Research context

OpenAlex topics: Thin-Film Transistor Technologies · ZnO doping and properties · Transition Metal Oxide Nanomaterials

SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.

Affiliations

Energy Research Institute, Nanyang Technological University, Singapore 637553

School of Physical and Mathematical Sciences, Nanyang Technological University, Singapore 637371

Institute of Materials Research and Engineering, 3 Research Link, Singapore 117602

School of Materials Science and Engineering, Nanyang Technological University, Singapore 637553

Singapore-Berkeley Research Initiative for Sustainable Energy (SinBeRISE), 1 Create Way, Singapore 138602

References (22)

Show source-provided references
1. Nomura K. · Nature · 2004 · 432 · 48810.1038/nature03090 ↗
2. Park J. S. · Thin Solid Films · 2012 · 520 · 167910.1016/j.tsf.2011.07.018 ↗
3. Banger K. K. · Nat. Mater. · 2011 · 10 · 4510.1038/nmat2914 ↗
4. Oo T. Z. · Org. Electron. · 2012 · 13 · 87010.1016/j.orgel.2012.01.011 ↗
5. Pal B. N. · Nat. Mater. · 2009 · 8 · 89810.1038/nmat2560 ↗
6. Lee D. H. · J. Mater. Chem. · 2009 · 19 · 313510.1039/b822893k ↗
7. Park K. B. · IEEE Electron Device Lett. · 2010 · 31 · 31110.1109/LED.2010.2040130 ↗
8. Kim H. G. · Appl. Phys. Lett. · 2009 · 94 · 23350110.1063/1.3151827 ↗
9. Ryu M. K. · Appl. Phys. Lett. · 2009 · 95 · 17350810.1063/1.3257726 ↗
10. Lee C. G. · Appl. Phys. Lett. · 2010 · 96 · 24350110.1063/1.3454241 ↗
11. Nomura K. · Nature · 2004 · 432 · 48810.1038/nature03090 ↗
12. Nomura K. · Science · 2003 · 300 · 126910.1126/science.1083212 ↗
13. Minami T. · J. Vac. Sci. Technol. · 1995 · 13 · 109510.1116/1.579592 ↗
14. Young D. L. · J. Appl. Phys. · 2002 · 92 · 31010.1063/1.1483104 ↗
15. Hwang S. · J. Am. Ceram. Soc. · 2012 · 95 · 32410.1111/j.1551-2916.2011.04791.x ↗
16. Kövér L. · Surf. Interface Anal. · 1995 · 23 · 46110.1002/sia.740230705 ↗
17. Choi W. K. · J. Mater. Sci. Lett. · 1997 · 16 · 155110.1023/A:1018547813759 ↗
18. Bürgi L. · J. Appl. Phys. · 2003 · 94 · 612910.1063/1.1613369 ↗
19. Khaderbad M. A. · ACS Appl. Mater. Interfaces · 2012 · 4 · 143410.1021/am201691s ↗
20. Liscio A. · J. Mater. Chem. · 2011 · 21 · 292110.1039/c0jm02940h ↗
21. Kim M. G. · Nat. Mat. · 2011 · 10 · 38210.1038/nmat3011 ↗
22. Tan H. S. · IEEE Electron Device Lett. · 2010 · 31 · 1311