journal article·2012-03-28

Impact of Oxygen Plasma Treatment on the Device Performance of Zinc Oxide Nanoparticle-Based Thin-Film Transistors

Hendrik Faber, Johannes Hirschmann, Martin Klaumünzer, Björn Braunschweig, Wolfgang Peukert, Marcus Halik

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Abstract

Thin-films of zinc oxide nanoparticles were investigated by photoluminescence spectroscopy and a broad defect-related yellow-green emission was observed. Oxygen plasma treatment was applied in order to reduce the number of defects, and the emission intensity was quenched to 4% of the initial value. Thin-film transistors that incorporate the nanoparticles as active semiconducting layers show an improved device performance after oxygen plasma treatment. The maximum drain current and the charge carrier mobility increased more than 1 order of magnitude up to a nominal value of 23 cm(2) V(-1) s(-1) and the threshold voltage was lowered.
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Research context

OpenAlex topics: ZnO doping and properties · Gas Sensing Nanomaterials and Sensors · Thin-Film Transistor Technologies

SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.

Affiliations

Organic Materials & Devices (OMD), Department of Materials Science, University Erlangen-Nürnberg, Martensstraße 7, 91058 Erlangen, Germany

Institute of Particle Technology, Dept. of Chemical and Biological Engineering, University Erlangen-Nürnberg, Cauerstraße 4, 91058 Erlangen, Germany

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