journal article·2015-10-14

Synthesis of Large-Area Highly Crystalline Monolayer Molybdenum Disulfide with Tunable Grain Size in a H2 Atmosphere

Yulin Feng, Kailiang Zhang, Fang Wang, Zhiwen Liu, Mingxu Fang, Rongrong Cao, Yinping Miao, Zhengchun Yang, Wei Mi, Yemei Han, Zhitang Song, H. S. Philip Wong

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Abstract

Large-area and highly crystalline monolayer molybdenum disulfide (MoS2) with a tunable grain size was synthesized in a H2 atmosphere. The influence of introduced H2 on MoS2 growth and grain size, as well as the corresponding mechanism, was tentatively explored by controlling the H2 flow rate. The as-grown monolayer MoS2 displays excellent uniformity and high crystallinity evidenced by Raman and high-resolution transmission electron microscopy. The Raman results also give an indication that the quality of the monolayer MoS2 synthesized in a H2 atmosphere is comparable to that synthesized by using seed or mechanical exfoliation. In addition, the electronic properties and dielectric inhomogeneity of MoS2 monolayers were also detected in situ via scanning microwave microscopy, with measurements on impedance and differential capacitance (dC/dV). Back-gated field-effect transistors based on highly crystalline monolayer MoS2 shows a field-effect mobility of ∼13.07 cm2 V(-1) s(-1) and an Ion/Ioff ratio of ∼1.1×10(7), indicating that the synthesis of large-area and high-quality monolayer MoS2 with H2 is a viable method for electronic and optoelectronic applications.
Source: openalex_inverted_index · Quality: baseline

Research context

OpenAlex topics: 2D Materials and Applications · MXene and MAX Phase Materials · Perovskite Materials and Applications

SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.

Affiliations

School of Electronic Information Engineering, Tianjin Key Laboratory of Film Electronic & Communication Devices, Tianjin University of Technology, Tianjin, 300384, China

Keysight Technologies (China) Co., Ltd., Beijing, 100102, China

State Key Laboratory of Functional Materials for Informatics, Shanghai Institute of Microsystem and Information Technology, Chinese Academy of Sciences, Shanghai, 200050, China

Department of Electrical Engineering and Center for Integrated Systems, Stanford University, Stanford, California 94305, United States

Funding

Tianjin Science and Technology Developmental Funds of Universities and Colleges · Natural Science Foundation of Tianjin City · National Natural Science Foundation of China · Program for New Century Excellent Talents in University

References (43)

Show source-provided references
1. 10.1126/science.110289610.1126/science.1102896 ↗
2. 10.1038/nmat184910.1038/nmat1849 ↗
3. 10.1021/nn400280c10.1021/nn400280c ↗
4. 10.1021/nl203635v10.1021/nl203635v ↗
5. 10.1038/nnano.2010.27910.1038/nnano.2010.279 ↗
6. 10.1038/nnano.2012.19310.1038/nnano.2012.193 ↗
7. 10.1021/nn501521510.1021/nn5015215 ↗
8. 10.1021/nl400687n10.1021/nl400687n ↗
9. 10.1038/nnano.2013.10010.1038/nnano.2013.100 ↗
10. 10.1021/nl304307910.1021/nl3043079 ↗
11. 10.1039/C4NR06331G10.1039/C4NR06331G ↗
12. 10.1002/adma.20140200810.1002/adma.201402008 ↗
13. 10.1021/nn506924j10.1021/nn506924j ↗
14. 10.1016/0025-5408(86)90011-510.1016/0025-5408(86)90011-5 ↗
15. 10.1126/science.246.4928.36910.1126/science.246.4928.369 ↗
16. 10.1021/nl403370410.1021/nl4033704 ↗
17. 10.1021/jp500050r10.1021/jp500050r ↗
18. 10.1021/nn405916t10.1021/nn405916t ↗
19. 10.1038/srep0186610.1038/srep01866 ↗
20. 10.1021/nn501019g10.1021/nn501019g ↗
21. 10.1038/nnano.2006.17110.1038/nnano.2006.171 ↗
22. 10.1246/cl.2001.77210.1246/cl.2001.772 ↗
23. 10.1039/C4NR02451F10.1039/C4NR02451F ↗
24. 10.1021/nl035011f10.1021/nl035011f ↗
25. 10.1021/nl204361210.1021/nl2043612 ↗
26. 10.1002/adma.20130323010.1002/adma.201303230 ↗
27. 10.1002/smll.20110265410.1002/smll.201102654 ↗
28. 10.1039/c3nr05993f10.1039/c3nr05993f ↗
29. 10.1038/nmat367310.1038/nmat3673 ↗
30. 10.1002/adma.20110479810.1002/adma.201104798 ↗
31. 10.1002/smll.20120194010.1002/smll.201201940 ↗
32. 10.1002/chem.20020463510.1002/chem.200204635 ↗
33. 10.1021/nn405719x10.1021/nn405719x ↗
34. 10.1021/nn403454e10.1021/nn403454e ↗
35. 10.1007/s12274-014-0417-z10.1007/s12274-014-0417-z ↗
36. 10.1038/nmat363310.1038/nmat3633 ↗
37. 10.1021/nn302517310.1021/nn3025173 ↗
38. 10.1021/nl201874w10.1021/nl201874w ↗
39. 10.1039/c3992000138610.1039/c39920001386 ↗
40. 10.1021/nl900222j10.1021/nl900222j ↗
41. Kasper, M.Introduction to Scanning Microwave Microscopy Mode. Application Note of Keysight Technologies, Inc., Publication No. 5989-8881EN, 2014.
42. 10.1002/adfm.20120343510.1002/adfm.201203435 ↗
43. 10.1088/0957-4484/23/38/38570610.1088/0957-4484/23/38/385706 ↗