journal article·2020-08-05

High-Crystallinity Epitaxial Sb2Se3 Thin Films on Mica for Flexible Near-Infrared Photodetectors

Xixing Wen, Zonghuan Lu, Lukas Valdman, Gwo-Ching Wang, Morris Washington, Toh-Ming Lu

ACS Applied Materials & Interfaces· Volume 12· Issue 31
Publisher page

Abstract

The V-VI binary chalcogenide, Sb2Se3, has attracted considerable attention for its applications in thin film optoelectronic devices because of its unique 1D structure and remarkable optoelectronic properties. Herein, we report an Sb2Se3 thin film epitaxially grown on a flexible mica substrate through a relatively weak (van der Waals) interaction by vapor transport deposition. The epitaxial Sb2Se3 thin films exhibit a single (120) out-of-plane orientation and a 0.25° full width at half-maximum of (120) rocking curve in X-ray diffraction, confirming the high crystallinity of the epitaxial films. The Sb2Se3(120) plane is epitaxially aligned on mica(001) surface with the in-plane relationship of Sb2Se3[2̅10]//mica[010] and Sb2Se3[001]//mica[100]. Compared to the photodetector made of a nonepitaxial Sb2Se3 film, the photocurrent of the epitaxial Sb2Se3 film photodetector is almost doubled. Furthermore, because of the flexibility and high sensitivity of the epitaxial Sb2Se3 film photodetector on mica, it has been successfully employed to detect the heart rate of a person. These encouraging results will facilitate the development of epitaxial Sb2Se3 film-based devices and potential applications in wearable electronics.
Source: europepmc · Quality: candidate unverified · Source record ↗

Research context

OpenAlex topics: Chalcogenide Semiconductor Thin Films · Quantum Dots Synthesis And Properties · Advanced Semiconductor Detectors and Materials

SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.

Affiliations

Center for Materials, Devices and Integrated Systems, Rensselaer Polytechnic Institute, Troy, New York 12180, United States

Department of Physics, Applied Physics and Astronomy, Rensselaer Polytechnic Institute, Troy, New York 12180, United States

Materials Science and Engineering Department, Rensselaer Polytechnic Institute, Troy, New York 12180, United States

Funding

Rensselaer Polytechnic Institute · Empire State Development's Division of Science, Technology and Innovation

References (33)

Show source-provided references
1. 10.1002/solr.20190002610.1002/solr.201900026 ↗
2. 10.1038/s41467-018-07903-610.1038/s41467-018-07903-6 ↗
3. 10.1038/s41467-018-04634-610.1038/s41467-018-04634-6 ↗
4. 10.1021/acsphotonics.9b0160910.1021/acsphotonics.9b01609 ↗
5. 10.1038/nphoton.2015.7810.1038/nphoton.2015.78 ↗
6. 10.1002/aelm.20160018210.1002/aelm.201600182 ↗
7. 10.1039/c5ra23542a10.1039/c5ra23542a ↗
8. 10.1002/smll.20180530710.1002/smll.201805307 ↗
9. 10.1021/acsenergylett.9b0041410.1021/acsenergylett.9b00414 ↗
10. 10.1021/acsenergylett.8b0232310.1021/acsenergylett.8b02323 ↗
11. 10.1021/acsnano.8b0544610.1021/acsnano.8b05446 ↗
12. 10.1002/adma.20190487610.1002/adma.201904876 ↗
13. 10.1038/nenergy.2016.14910.1038/nenergy.2016.149 ↗
14. Ayers J. E. · 201610.1201/9781315372440 ↗
15. 10.1103/physrevmaterials.2.11340210.1103/physrevmaterials.2.113402 ↗
16. 10.1038/nature2205310.1038/nature22053 ↗
17. 10.1038/s41928-019-0314-210.1038/s41928-019-0314-2 ↗
18. 10.1002/smll.20190023610.1002/smll.201900236 ↗
19. 10.1016/j.cjph.2019.07.00210.1016/j.cjph.2019.07.002 ↗
20. 10.1016/j.solmat.2004.02.01310.1016/j.solmat.2004.02.013 ↗
21. 10.1063/1.500050210.1063/1.5000502 ↗
22. 10.1107/s0365110x5700029810.1107/s0365110x57000298 ↗
23. 10.1002/adfm.20190984910.1002/adfm.201909849 ↗
24. 10.1039/c9ce01515a10.1039/c9ce01515a ↗
25. 10.1063/1.505264410.1063/1.5052644 ↗
26. 10.1063/1.498008810.1063/1.4980088 ↗
27. 10.1002/advs.20150010910.1002/advs.201500109 ↗
28. 10.1039/c3tc31883d10.1039/c3tc31883d ↗
29. 10.1016/j.matlet.2017.01.08610.1016/j.matlet.2017.01.086 ↗
30. 10.1039/c6tc02296k10.1039/c6tc02296k ↗
31. 10.1021/acs.jpcc.8b0946910.1021/acs.jpcc.8b09469 ↗
32. 10.1021/acsphotonics.7b0083710.1021/acsphotonics.7b00837 ↗
33. 10.1021/acs.jpcc.9b0232010.1021/acs.jpcc.9b02320 ↗