journal article·2020-02-26

Defect Passivation and Photoluminescence Enhancement of Monolayer MoS2 Crystals through Sodium Halide-Assisted Chemical Vapor Deposition Growth

Wenfeng Wang, Haibo Shu, Jun Wang, Yecheng Cheng, Pei Liang, Xiaoshuang Chen

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Abstract

Recent success in the chemical vapor deposition (CVD) growth of atomically thin transition metal dichalcogenide (TMD) crystals opens up prospects for exploiting these materials in nanoelectronic and optoelectronic devices. However, CVD-grown TMDs often suffer from weak crystal quality because of the formation of defects during the growth, which makes a large impact on their electrical and optical properties. Here, we report a facile synthesis of high-quality MoS2 monolayers through a sodium halide-assisted CVD method. Our results show that the addition of sodium halides into MoO3 precursors leads to the rapid growth of highly crystalline MoS2 monolayers. Moreover, the overall photoluminescence (PL) intensity of MoS2 monolayers can be greatly enhanced by up to 2 orders of magnitude. The PL enhancement originates from that the deep trap states induced by sulfur vacancies are passivated by the substitution doping of halogen atoms, which promotes the emission of excitons and trions. Density functional theory calculations indicate that the band gaps of halogen-doped MoS2 monolayers are slightly smaller than those of pristine MoS2 monolayer, which is responsible for the small red shift of PL peaks (∼30 meV). These findings provide a new route toward engineering electronic and optical properties of MoS2 and other TMD monolayers.
Source: openalex_inverted_index · Quality: baseline

Research context

OpenAlex topics: 2D Materials and Applications · MXene and MAX Phase Materials · Perovskite Materials and Applications

SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.

Affiliations

College of Optical and Electronic Technology, China Jiliang University, 310018 Hangzhou, China

National Laboratory for Infrared Physics, Shanghai Institute of Technical Physics, Chinese Academy of Science, 200083 Shanghai, China

Funding

Shanghai Science and Technology Development Foundation · National Natural Science Foundation of China

References (55)

Show source-provided references
1. 10.1038/nnano.2012.19310.1038/nnano.2012.193 ↗
2. 10.1038/nchem.158910.1038/nchem.1589 ↗
3. 10.1021/nn500064s10.1021/nn500064s ↗
4. 10.1103/physrevlett.105.13680510.1103/physrevlett.105.136805 ↗
5. 10.1002/adfm.20160409310.1002/adfm.201604093 ↗
6. 10.1038/nmat350510.1038/nmat3505 ↗
7. 10.1038/nnano.2010.27910.1038/nnano.2010.279 ↗
8. 10.1021/nn303772b10.1021/nn303772b ↗
9. 10.1021/acsnano.7b0314810.1021/acsnano.7b03148 ↗
10. 10.1002/adma.20130124410.1002/adma.201301244 ↗
11. 10.1002/adma.20150512410.1002/adma.201505124 ↗
12. 10.1126/science.125056410.1126/science.1250564 ↗
13. 10.1002/smll.20130154210.1002/smll.201301542 ↗
14. 10.1021/jacs.7b0513110.1021/jacs.7b05131 ↗
15. 10.1063/1.488539110.1063/1.4885391 ↗
16. 10.1021/ja401348510.1021/ja4013485 ↗
17. 10.1002/adma.20110479810.1002/adma.201104798 ↗
18. 10.1021/acs.cgd.7b0148610.1021/acs.cgd.7b01486 ↗
19. 10.1039/c4cs00256c10.1039/c4cs00256c ↗
20. 10.1002/adma.20150135410.1002/adma.201501354 ↗
21. 10.1021/nl400747910.1021/nl4007479 ↗
22. 10.1021/acsnano.5b0585410.1021/acsnano.5b05854 ↗
23. 10.1038/s41467-019-11751-310.1038/s41467-019-11751-3 ↗
24. 10.1038/ncomms729310.1038/ncomms7293 ↗
25. 10.1021/nl503636c10.1021/nl503636c ↗
26. 10.1021/nl503799t10.1021/nl503799t ↗
27. 10.1103/physrevb.91.16541110.1103/physrevb.91.165411 ↗
28. 10.1021/acsnano.7b0841810.1021/acsnano.7b08418 ↗
29. 10.1021/jacs.5b1051910.1021/jacs.5b10519 ↗
30. 10.1021/nn500532f10.1021/nn500532f ↗
31. 10.1021/acsami.9b0039010.1021/acsami.9b00390 ↗
32. 10.1002/anie.20150882810.1002/anie.201508828 ↗
33. 10.1126/sciadv.170166110.1126/sciadv.1701661 ↗
34. 10.1126/science.aad211410.1126/science.aad2114 ↗
35. 10.1021/acsnano.5b0440010.1021/acsnano.5b04400 ↗
36. 10.1021/acsnano.5b0517310.1021/acsnano.5b05173 ↗
37. 10.1038/ncomms629010.1038/ncomms6290 ↗
38. 10.1002/adma.20160676010.1002/adma.201606760 ↗
39. 10.1021/acsnano.5b0696010.1021/acsnano.5b06960 ↗
40. 10.1021/acs.langmuir.8b0142510.1021/acs.langmuir.8b01425 ↗
41. 10.1038/s41586-018-0008-310.1038/s41586-018-0008-3 ↗
42. 10.1002/adfm.20110211110.1002/adfm.201102111 ↗
43. 10.1021/nn100393710.1021/nn1003937 ↗
44. 10.1021/nl903868w10.1021/nl903868w ↗
45. 10.1038/srep0265710.1038/srep02657 ↗
46. 10.1088/1361-6463/aa5c6a10.1088/1361-6463/aa5c6a ↗
47. 10.1103/physrevb.88.12130110.1103/physrevb.88.121301 ↗
48. 10.1038/s41563-018-0055-z10.1038/s41563-018-0055-z ↗
49. 10.1021/acsami.7b1247810.1021/acsami.7b12478 ↗
50. 10.1021/nl403036h10.1021/nl403036h ↗
51. 10.1103/physrevb.59.175810.1103/physrevb.59.1758 ↗
52. 10.1103/physrevb.50.1795310.1103/physrevb.50.17953 ↗
53. 10.1103/physrevb.54.1116910.1103/physrevb.54.11169 ↗
54. 10.1103/revmodphys.64.104510.1103/revmodphys.64.1045 ↗
55. 10.1021/jp509771310.1021/jp5097713 ↗