journal article·2016-11-30

Optoelectronic Properties of Few-Layer MoS2 FET Gated by Ferroelectric Relaxor Polymer

Yan Chen, Xudong Wang, Peng Wang, Hai Huang, Guangjian Wu, Bobo Tian, Zhenchen Hong, Yutao Wang, Shuo Sun, Hong Shen, Jianlu Wang, Weida Hu, Jinglan Sun, Xiangjian Meng, Junhao Chu

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Abstract

Recently, new devices combining two-dimensional (2D) materials with ferroelectrics, have been a new hotspot for promising applications in electronics and optoelectronics. Here, we design a new type of FET using the 2D MoS 2 and poly(vinylidene fluoride-trifluoroethylene-chlorofloroethylene) terpolymer ferroelectric relaxor. The devices exhibit excellent performance including a large on/off ratio) and an insignificant leakage current. Moreover, the hysteresis characteristics are effectively modulated for its ferroelectric properties at low temperature. Additionally, a broad range photoresponse (visible to 1.55 μm) and a high sensitivity (>300 A/W, λ = 450 nm) are achieved. These results indicate that ferroelectric relaxor can be applied into the high-performance 2D optoelectronic devices.
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Research context

OpenAlex topics: 2D Materials and Applications · Perovskite Materials and Applications · Advanced Sensor and Energy Harvesting Materials

SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.

Affiliations

National Laboratory for Infrared Physics, Shanghai Institute of Technical Physics, Chinese Academy of Sciences, 500 Yu Tian Road, Shanghai 200083, China

University of Chinese Academy of Sciences, 19 Yuquan Road, Beijing 100049, China

Department of Physics, University of Science and Technology of China, Hefei 230000, China

Funding

Natural Science Foundation of Shanghai · Ministry of Science and Technology of the People's Republic of China · National Natural Science Foundation of China · Chinese Academy of Sciences

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